40 C.F.R. § 98 app Table I-7 To Subpart I of Part 98
Current through May 31, 2024
| Process type factors | Process gas i | ||||||||
| CF4 | C2F6 | CHF3 | CH2F2 | C3F8 | c- C4F8 | NF3 Remote | NF3 | SF6 | |
| Etch 1-Ui | 0.7 | 0.4 | 0.4 | NA | NA | 0.2 | NA | NA | 0.4 |
| Etch BCF4 | NA | 0.2 | NA | NA | NA | 0.1 | NA | NA | NA |
| Etch BC2F6 | NA | NA | NA | NA | NA | 0.1 | NA | NA | NA |
| CVD Chamber Cleaning 1-Ui | NA | 0.6 | NA | NA | 0.1 | 0.1 | NA | 0.3 | 0.4 |
| CVD Chamber Cleaning BCF4 | NA | 0.2 | NA | NA | 0.2 | 0.1 | NA | NA | NA |
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.
40 C.F.R. 98 app Table I-7 To Subpart I of Part 98