Process type factors | Process gas i | ||||||||
CF4 | C2F6 | CHF3 | CH2F2 | C3F8 | c- C4F8 | NF3 Remote | NF3 | SF6 | |
Etch 1-Ui | 0.6 | NA | 0.2 | NA | NA | 0.1 | NA | NA | 0.3 |
Etch BCF4 | NA | NA | 0.07 | NA | NA | 0.009 | NA | NA | NA |
Etch BCHF3 | NA | NA | NA | NA | NA | 0.02 | NA | NA | NA |
Etch BC2F4 | NA | NA | 0.05 | NA | NA | NA | NA | NA | NA |
CVD Chamber Cleaning 1-Ui | NA | NA | NA | NA | NA | NA | 0.03 | 0.3 | 0.9 |
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.
40 C.F.R. 98 app Table I-6 to Subpart I of Part 98