Unless defined below, all terms in 8.0 of this regulation have the meanings given them in the Act or in 3.2 of this regulation.
"Administrator" means the Administrator of the United States Environmental Protection Agency.
"Affected facility" means, for the purposes of 8.0 of this regulation, all solvent cleaning machines subject to 8.0, except for the following.
* | Solvent cleaning machines used in the manufacture or maintenance of aerospace products. |
* | Solvent cleaning machines used in the manufacture of narrow tubing. |
* | Continuous web cleaning machines, located at a major source that is subject to the facility-wide limits in 8.10.2.2 of this regulation. |
* | Cold batch cleaning machines, located at an area source that is subject to the facility-wide limits in 8.10.2.2 of this regulation. |
"Air blanket" means the layer of air inside the solvent cleaning machine freeboard located above the solvent/air interface. The centerline of the air blanket is equidistant between the sides of the machine.
"Air knife system" means a device that directs forced air at high pressure, high volume, or a combination of high pressure and high volume, through a small opening directly at the surface of a continuous web part. The purpose of this system is to remove the solvent film from the surfaces of the continuous web part.
"Automated parts handling system" means a mechanical device that carries all parts and parts baskets at a controlled speed from the initial loading of soiled or wet parts through the removal of the cleaned or dried parts. Automated parts handling systems include, but are not limited to, hoists and conveyors.
"Batch cleaning machine" means a solvent cleaning machine in which individual parts or a set of parts move through the entire cleaning cycle before new parts are introduced into the solvent cleaning machine. An open-top vapor cleaning machine is a type of batch cleaning machine. A solvent cleaning machine, such as a ferris wheel or a cross-rod degreaser, that clean multiple batch loads simultaneously and are manually loaded are batch cleaning machines.
"Carbon adsorber" means a bed of activated carbon into which an air-solvent gas-vapor stream is routed and which adsorbs the solvent on the carbon.
"Clean liquid solvent" means fresh unused solvent, recycled solvent, or used solvent that has been cleaned of soils (e.g., skimmed of oils or sludge and strained of metal chips).
"Cleaning capacity" means, for a cleaning machine without a solvent/air interface, the maximum volume of parts that can be cleaned at one time. In most cases, the cleaning capacity is equal to the volume (length times width times height) of the cleaning chamber.
"Cold cleaning machine" means any device or piece of equipment that contains or uses liquid solvent, into which parts are placed to remove soils from the surfaces of the parts or to dry the parts. Cleaning machines that contain and use heated, nonboiling solvent to clean the parts are classified as cold cleaning machines.
"Combined squeegee and air-knife system" means a system consisting of a combination of a squeegee system and an air-knife system within a single enclosure.
"Consumption" means the amount of halogenated HAP solvent added to the solvent cleaning machine.
"Continuous web cleaning machine" means a solvent cleaning machine in which parts such as film, coils, wire, and metal strips are cleaned at speeds typically in excess of 11 feet per minute. Parts are generally uncoiled, cleaned such that the same part is simultaneously entering and exiting the solvent application area of the solvent cleaning machine, and then recoiled or cut. For the purposes of 8.0 of this regulation, all continuous web cleaning machines are considered to be a subset of in-line solvent cleaning machines.
"Cover" means a lid, top, or portal cover that shields the solvent cleaning machine openings from air disturbances when in place and is designed to be easily opened and closed without disturbing the vapor zone. Air disturbances include, but are not limited to, lip exhausts, ventilation fans, and general room drafts. Types of covers include, but are not limited to, sliding, biparting, and roll top covers.
"Cross-rod solvent cleaning machine" means a batch solvent cleaning machine in which parts baskets are suspended from "cross-rods" as they are moved through the machine. In a cross-rod cleaning machine, parts are loaded semi-continuously, and enter and exit the machine from a single portal.
"Downtime mode" means the time period when a solvent cleaning machine is not cleaning parts and the sump heating coils, if present, are turned off.
"Dwell" means the technique of holding parts within the freeboard area but above the vapor zone of the solvent cleaning machine. Dwell occurs after cleaning to allow solvent to drain from the parts or parts baskets back into the solvent cleaning machine.
"Dwell time" means the required minimum length of time that a part must dwell, as determined in 8.6.4 of this regulation.
"Emissions" means halogenated HAP solvent consumed (i.e., halogenated HAP solvent added to the machine) minus the liquid halogenated HAP solvent removed from the machine and the halogenated HAP solvent removed from the machine in the solid waste.
"Existing" means any solvent cleaning machine the construction or reconstruction of which was commenced on or before November 29, 1993. An existing solvent cleaning machine moved within a contiguous facility or to another facility under the same ownership remains an existing machine.
"Freeboard area" means; for a batch cleaning machine, the area within the solvent cleaning machine that extends from the solvent/air interface to the top of the solvent cleaning machine; for an in-line cleaning machine, it is the area within the solvent cleaning machine that extends from the solvent/air interface to the bottom of the entrance or exit opening, whichever is lower.
"Freeboard height" means; for a batch cleaning machine, the distance from the solvent/air interface, as measured during the idling mode, to the top of the cleaning machine; for an in-line cleaning machine, it is the distance from the solvent/air interface to the bottom of the entrance or exit opening, whichever is lower, as measured during the idling mode.
"Freeboard ratio" means the ratio of the solvent cleaning machine freeboard height to the smaller interior dimension (length, width, or diameter) of the solvent cleaning machine.
"Freeboard refrigeration device" (also called a chiller) means a set of secondary coils mounted in the freeboard area that carries a refrigerant or other chilled substance to provide a chilled air blanket above the solvent vapor. A primary condenser capable of meeting the requirements of 8.4.5.2.1 of this regulation is defined as both a freeboard refrigeration device and a primary condenser for the purposes of these standards.
"Halogenated hazardous air pollutant solvent" or "halogenated HAP solvent" means methylene chloride (CAS No. 75-09-2), perchloroethylene (CAS No. 127-18-4), trichloroethylene (CAS No. 79-01-6), 1,1,1-trichloroethane (CAS No. 71-55-6), carbon tetrachloride (CAS No. 56-23-5), and chloroform (CAS No. 67-66-3).
"Hoist" means a mechanical device that carries the parts basket and the parts to be cleaned from the loading area into the solvent cleaning machine and to the unloading area at a controlled speed. A hoist may be operated by controls or may be programmed to cycle parts through the cleaning cycle automatically.
"Idling mode" means the time period when a solvent cleaning machine is not actively cleaning parts and the sump heating coils, if present, are turned on.
"Idling-mode cover" means any cover or solvent cleaning machine design that allows the cover to shield the cleaning machine openings during the idling mode. A cover that meets this definition can also be used as a working-mode cover if that definition is also met.
"Immersion cold cleaning machine" means a cold cleaning machine in which the parts are immersed in the solvent when being cleaned. A remote reservoir cold cleaning machine that is also an immersion cold cleaning machine is considered an immersion cold cleaning machine for purposes of 8.0 of this regulation.
"In-line cleaning machine" or "continuous cleaning machine" means a solvent cleaning machine that uses an automated parts handling system, typically a conveyor, to automatically provide a continuous supply of parts to be cleaned. These solvent cleaning machines are fully enclosed except for the conveyor inlet and exit portals. In-line cleaning machines can be either cold or vapor cleaning machines.
"Leak-proof coupling" means a threaded or other type of coupling that prevents solvents from leaking while filling or draining solvent to and from the solvent cleaning machine.
"Lip exhaust" means a device installed at the top of the opening of a solvent cleaning machine that draws in air and solvent vapor from the freeboard area and ducts the air and vapor away from the solvent cleaning area.
"Manufacture of narrow tubing"means primarily engaged in the production of small diameter (mechanical and hypodermic size) cold drawn metallic, seamless tubes from materials such as stainless steel, nickel alloys, titanium and its alloys, and alloys of zirconium with a portion of the outside diameters 0.25 inches or less.
"Manufacture or maintenance of aerospace products"means engaged in the manufacture, rework, or repair of aircraft such as airplanes, helicopters, missiles, rockets, and space vehicles.
"Monthly reporting period" means any calendar month in which the owner or operator of a solvent cleaning machine is required to calculate and report the solvent emissions from each solvent cleaning machine.
"New" means any solvent cleaning machine the construction or reconstruction of which is commenced after November 29, 1993.
"Open-top vapor cleaning machine" means a batch solvent cleaning machine that has its upper surface open to the air and boils solvent to create solvent vapor used to clean or dry parts.
"Part" means any object that is cleaned or dried in a solvent cleaning machine. Parts include, but are not limited to, discrete parts, assemblies, sets of parts, and parts cleaned or dried in a continuous web cleaning machine (i.e., continuous sheets of metal or film).
"Primary condenser" means a series of circumferential cooling coils on a vapor cleaning machine through which a chilled substance is circulated or recirculated to provide continuous condensation of rising solvent vapors and, thereby, create a concentrated solvent vapor zone.
"Reduced room draft" means decreasing the flow or movement of air across the top of the freeboard area of the solvent cleaning machine to meet the specifications of 8.4.5.2.2 of this regulation. Methods of achieving a reduced room draft include, but are not limited to, redirecting fans or air vents to not blow across the cleaning machine, moving the cleaning machine to a corner where there is less room draft, and constructing a partial or complete enclosure around the cleaning machine.
"Remote reservoir cold cleaning machine" means any device in which liquid solvent is pumped to a sink-like work area that drains solvent back into an enclosed container while parts are being cleaned, allowing no solvent to pool in the work area.
"Remote reservoir continuous web cleaning machine" means a continuous web cleaning machine in which there is no exposed solvent sump. In these solvent cleaning machines, the solvent is pumped from an enclosed chamber and is typically applied to the continuous web part through a nozzle or series of nozzles. The solvent then drains from the part and is collected and recycled through the machine, allowing no solvent to pool in the work or cleaning area.
"Soils" mean contaminants that are removed from the parts being cleaned. Soils include, but are not limited to, greases, oils, waxes, metal chips, carbon deposits, fluxes, and tars.
"Solvent/air interface" means, for a vapor cleaning machine, the location of contact between the concentrated solvent vapor layer and the air. This location of contact is defined as the mid-line height of the primary condenser coils. For a cold cleaning machine, it is the location of contact between the liquid solvent and the air.
"Solvent/air interface area" means; for a vapor cleaning machine, the surface area of the solvent vapor zone that is exposed to the air; for an in-line cleaning machine, it is the total surface area of all the sumps; for a cold cleaning machine, it is the surface area of the liquid solvent that is exposed to the air.
"Solvent cleaning machine" means any device or piece of equipment that uses halogenated HAP solvent liquid or vapor to remove soils from the surfaces of materials. Types of solvent cleaning machines include, but are not limited to, batch vapor, in-line vapor, in-line cold, and batch cold solvent cleaning machines. Buckets, pails, and beakers with capacities of one liter (34 ounces) or less are not considered solvent cleaning machines.
"Solvent vapor zone" means; for a vapor cleaning machine, the area that extends from the liquid solvent surface to the level that solvent vapor is condensed. This condensation level is defined as the midline height of the primary condenser coils.
"Squeegee system" means a system that uses a series of pliable surfaces to remove the solvent film from the surfaces of the continuous web part. These pliable surfaces, called squeegees, are typically made of rubber or plastic media, and need to be periodically replaced to ensure continued proper function.
"Sump" means the part of a solvent cleaning machine where the liquid solvent is located.
"Sump heater coils" means the heating system on a cleaning machine that uses steam, electricity, or hot water to heat or boil the liquid solvent.
"Superheated part technology" means a system that is part of the continuous web process that heats the continuous web part either directly or indirectly to a temperature above the boiling point of the cleaning solvent. This could include a process step, such as a tooling die that heats the part as it is processed, as long as the part remains superheated through the cleaning machine.
"Superheated vapor system" means a system that heats the solvent vapor, either passively or actively, to a temperature above the solvent's boiling point. Parts are held in the superheated vapor before exiting the machine to evaporate the liquid solvent on them. Hot vapor recycle is an example of a superheated vapor system.
"Vapor cleaning machine" means a batch or in-line solvent cleaning machine that boils liquid solvent generating solvent vapor that is used as a part of the cleaning or drying cycle.
"Water layer" means a layer of water that floats above the denser solvent and provides control of solvent emissions. In many cases, the solvent used in batch cold cleaning machines is sold containing the appropriate amount of water to create a water cover.
"Working mode" means the time period when the solvent cleaning machine is actively cleaning or drying parts.
"Working-mode cover" means any cover or solvent cleaning machine design that allows the cover to shield the cleaning machine openings from outside air disturbances while parts are being cleaned in the cleaning machine. A cover that is used during the working mode is opened only during parts entry and removal. A cover that meets this definition can also be used as an idling-mode cover if that definition is also met.
Table 8-1 - Control Combinations for Batch Vapor Solvent Cleaning Machines With a Solvent/Air Interface Area of 1.21 Square Meters (13 Square Feet) or Less | |
Option | Control combinations |
1 | Working-mode cover, freeboard ratio of 1.0, superheated vapor. |
2 | Freeboard refrigeration device, superheated vapor. |
3 | Working-mode cover, freeboard refrigeration device. |
4 | Reduced room draft, freeboard ratio of 1.0, superheated vapor. |
5 | Freeboard refrigeration device, reduced room draft. |
6 | Freeboard refrigeration device, freeboard ratio of 1.0. |
7 | Freeboard refrigeration device, dwell. |
8 | Reduced room draft, dwell, freeboard ratio of 1.0. |
9 | Freeboard refrigeration device, carbon adsorber. |
10 | Freeboard ratio of 1.0, superheated vapor, carbon adsorber. |
Note: Unlike most of the control techniques available for complying with 8.0 of this regulation, carbon adsorbers are not considered to be a pollution prevention measure. Use of such units may impose additional cost and burden for a number of reasons. First, carbon adsorption units are generally more expensive than other controls listed in the options. Second, these units may present cross-media impacts such as effluent discharges if not properly operated and maintained, and spent carbon beds have to be disposed of as hazardous waste. When making decisions about what controls to install on halogenated HAP solvent cleaning machines to meet the requirements of 8.0, all of these factors should be weighed and pollution prevention measures are encouraged wherever possible.
Table 8-2 - Control Combinations for Batch Vapor Solvent Cleaning Machines With a Solvent/Air Interface Area Greater than 1.21 Square Meters (13 Square Feet) | |
Option | Control combinations |
1 | Freeboard refrigeration device, freeboard ratio of 1.0, superheated vapor. |
2 | Dwell, freeboard refrigeration device, reduced room draft. |
3 | Working-mode cover, freeboard refrigeration device, superheated vapor. |
4 | Freeboard ratio of 1.0, reduced room draft, superheated vapor. |
5 | Freeboard refrigeration device, reduced room draft, superheated vapor. |
6 | Freeboard refrigeration device, reduced room draft, freeboard ratio of 1.0. |
7 | Freeboard refrigeration device, superheated vapor, carbon adsorber. |
Note: Unlike most of the control techniques available for complying with 8.0 of this regulation, carbon adsorbers are not considered to be a pollution prevention measure. Use of such units may impose additional cost and burden for a number of reasons. First, carbon adsorption units are generally more expensive than other controls listed in the options. Second, these units may present cross-media impacts such as effluent discharges if not properly operated and maintained, and spent carbon beds have to be disposed of as hazardous waste. When making decisions about what controls to install on halogenated HAP solvent cleaning machines to meet the requirements of 8.0, all of these factors should be weighed and pollution prevention measures are encouraged wherever possible.
Table 8-3 - Control Combinations for Existing In-Line Solvent Cleaning Machines | |
Option | Control combinations |
1 | Superheated vapor, freeboard ratio of 1.0. |
2 | Freeboard refrigeration device, freeboard ratio of 1.0. |
3 | Dwell, freeboard refrigeration device. |
4 | Dwell, carbon adsorber. |
Note: Unlike most of the control techniques available for complying with 8.0 of this regulation, carbon adsorbers are not considered to be a pollution prevention measure. Use of such units may impose additional cost and burden for a number of reasons. First, carbon adsorption units are generally more expensive than other controls listed in the options. Second, these units may present cross-media impacts such as effluent discharges if not properly operated and maintained, and spent carbon beds have to be disposed of as hazardous waste. When making decisions about what controls to install on halogenated HAP solvent cleaning machines to meet the requirements of 8.0, all of these factors should be weighed and pollution prevention measures are encouraged wherever possible.
Table 8-4 - Control Combinations for New In-Line Solvent Cleaning Machines | |
Option | Control combinations |
1 | Superheated vapor, freeboard refrigeration device. |
2 | Freeboard refrigeration device, carbon adsorber. |
3 | Superheated vapor, carbon adsorber. |
Note: Unlike most of the control techniques available for complying with 8.0 of this regulation, carbon adsorbers are not considered to be a pollution prevention measure. Use of such units may impose additional cost and burden for a number of reasons. First, carbon adsorption units are generally more expensive than other controls listed in the options. Second, these units may present cross-media impacts such as effluent discharges if not properly operated and maintained, and spent carbon beds have to be disposed of as hazardous waste. When making decisions about what controls to install on halogenated HAP solvent cleaning machines to meet the requirements of 8.0, all of these factors should be weighed and pollution prevention measures are encouraged wherever possible.
Table 8-5 - Emission Limits for Batch Vapor and In-Line Solvent Cleaning Machines With a Solvent/Air Interface | |
Solvent cleaning machine | Three-month rolling average monthly emission limit (kilograms/square meters/month) |
Batch vapor solvent cleaning machines | 150 |
Existing in-line solvent cleaning machines | 153 |
New in-line solvent cleaning machines | 99 |
Table 8-6 - Emission Limits for Cleaning Machines Without a Solvent/Air Interface | |||
Cleaning capacity (cubic meters) | Three-month rolling average monthly emission limit (kilograms/month) | Cleaning capacity (cubic meters) | Three-month rolling average monthly emission limit (kilograms/month) |
0.00 | 0 | 1.50 | 421 |
0.05 | 55 | 1.55 | 429 |
0.10 | 83 | 1.60 | 438 |
0.15 | 106 | 1.65 | 446 |
0.20 | 126 | 1.70 | 454 |
0.25 | 144 | 1.75 | 462 |
0.30 | 160 | 1.80 | 470 |
0.35 | 176 | 1.85 | 477 |
0.40 | 190 | 1.90 | 485 |
0.45 | 204 | 1.95 | 493 |
0.50 | 218 | 2.00 | 500 |
0.55 | 231 | 2.05 | 508 |
0.60 | 243 | 2.10 | 515 |
0.65 | 255 | 2.15 | 522 |
0.70 | 266 | 2.20 | 530 |
0.75 | 278 | 2.25 | 537 |
0.80 | 289 | 2.30 | 544 |
0.85 | 299 | 2.35 | 551 |
0.90 | 310 | 2.40 | 558 |
0.95 | 320 | 2.45 | 565 |
1.00 | 330 | 2.50 | 572 |
1.05 | 340 | 2.55 | 579 |
1.10 | 349 | 2.60 | 585 |
1.15 | 359 | 2.65 | 592 |
1.20 | 368 | 2.70 | 599 |
1.25 | 377 | 2.75 | 605 |
1.30 | 386 | 2.80 | 612 |
1.35 | 395 | 2.85 | 619 |
1.40 | 404 | 2.90 | 625 |
1.45 | 412 | 2.95 | 632 |
EL = 330 * (Vol) 0.6 (8-1)
where:
EL = the three-month rolling average monthly emission limit (kilograms/month).
Vol = the cleaning capacity of the solvent cleaning machine (cubic meters).
Ei = (SAi - LSRi - SSRi) / AREAi (8-2)
En = (SAi - LSRi - SSRi) (8-3)
where:
Ei = the total halogenated HAP solvent emissions from the solvent cleaning machine during the most recent monthly reporting period i, (kilograms of solvent per square meter of solvent/air interface area per month).
En = the total halogenated HAP solvent emissions from the solvent cleaning machine during the most recent monthly reporting period i, (kilograms of solvent per month).
SAi = the total amount of halogenated HAP liquid solvent added to the solvent cleaning machine during the most recent monthly reporting period i, (kilograms of solvent per month).
LSRi = the total amount of halogenated HAP liquid solvent removed from the solvent cleaning machine during the most recent monthly reporting period i, (kilograms of solvent per month).
SSRi = the total amount of halogenated HAP solvent removed from the solvent cleaning machine in solid waste, obtained as described in 8.6.3.2 of this regulation, during the most recent monthly reporting period i, (kilograms of solvent per month).
AREAi = the solvent/air interface area of the solvent cleaning machine (square meters).
(8-4)
(8-5)
where:
EAi = the average halogenated HAP solvent emissions over the preceding three monthly reporting periods, (kilograms of solvent per square meter of solvent/air interface area per month).
EAn = the average halogenated HAP solvent emissions over the preceding three monthly reporting periods, (kilograms of solvent per month).
Ei = halogenated HAP solvent emissions for each month (j) for the most recent three monthly reporting periods, (kilograms of solvent per square meter of solvent/air interface area per month).
En = halogenated HAP solvent emissions for each month (j) for the most recent three monthly reporting periods, (kilograms of solvent per month).
j = 1 = the most recent monthly reporting period.
j = 2 = the monthly reporting period immediately prior to j = 1.
j = 3 = the monthly reporting period immediately prior to j = 2.
PTEi = Hi * Wi * SAIi (8-6)
where:
PTEi = the potential to emit for solvent cleaning machine i, (kilograms of solvent per year).
Hi = hours of operation for solvent cleaning machine i, (hours per year).
= 8760 hours per year, unless otherwise restricted by a Federally enforceable requirement.
Wi = the working mode uncontrolled emission rate, (kilograms per square meter per hour).
= 1.95 kilograms per square meter per hour for batch vapor and cold cleaning machines.
= 1.12 kilograms per square meter per hour for in-line cleaning machines.
SAIi = solvent/air interface area of each solvent cleaning machine i, (square meters). The solvent/air interface area for those machines that have a solvent/air interface is defined in 8.2 of this regulation. Cleaning machines that do not have a solvent/air interface shall calculate a solvent/air interface area using the procedure in 8.6.5.2 of this regulation.
SAI = 2.20 * (Vol) 0.6 (8-7)
where:
SAI = the solvent/air interface area, (square meters).
Vol = the cleaning capacity of the solvent cleaning machine, (cubic meters).
Eo = (Ri * 100) / (Ri + Sai - SSRi) (8-8)
where:
Eo = overall cleaning system control efficiency.
Ri = the total amount of halogenated HAP liquid solvent recovered from the carbon adsorption system and recycled to the solvent cleaning system during the most recent monthly reporting period, i, (kilograms of solvent per month).
Sai = the total amount of halogenated HAP liquid solvent added to the solvent cleaning system during the most recent monthly reporting period, i, (kilograms of solvent per month).
SSRi = the total amount of halogenated HAP solvent removed from the solvent cleaning system in solid waste, obtained as described in 8.6.3.2 of this regulation, during the most recent monthly reporting period, i, (kilograms of solvent per month).
For purposes of 8.10 of this regulation, ''each solvent cleaning machine'' means each solvent cleaning machine that is part of an affected facility subject to the provisions of 8.10.
TABLE 8-7 - Facility-wide 12-month rolling total halogenated HAP solvent emission limits for affected facilities with solvent cleaning machines | ||
Solvents emitted | Facility-wide 12-month rolling total emission limits for general population solvent cleaning machines (kilograms) | Facility-wide 12-month rolling total emission limit for solvent cleaning machines at military depot maintenance facilities (kilograms) |
Perchloroethylene only | 4,800 | 8,000 |
Trichloroethylene only | 14,100 | 23,500 |
Methylene chloride only | 60,000 | 100,000 |
Multiple solvents - Calculate the methylene chloride-weighted facility-wide 12-month rolling total halogenated HAP solvent emissions (WE) using equation 8-9 | 60,000 | 100,000 |
WE = (12.5 * PCE)+(4.25 * TCE)+(MC) | (8-9) |
where:
WE = Methylene chloride-weighted facility-wide 12-month rolling total halogenated HAP solvent emissions in kilograms.
PCE = Facility-wide 12-month rolling total perchloroethylene emissions from all solvent cleaning machines at the affected facility in kilograms.
TCE = Facility-wide 12-month rolling total trichloroethylene emissions from all solvent cleaning machines at the affected facility in kilograms.
MC = Facility-wide 12-month rolling total methylene chloride emissions from all solvent cleaning machines at the affected facility in kilograms.
Eunit = SAi - LSRi - SSRi | (8-10) |
where:
Eunit= the total halogenated HAP solvent emissions from the solvent cleaning machine during the most recent month i, (kilograms per month).
SAi = the total amount of halogenated HAP liquid solvent added to the solvent cleaning machine during the most recent month i, (kilograms per month).
LSRi = the total amount of halogenated HAP liquid solvent removed from the solvent cleaning machine during the most recent month i, (kilograms per month).
SSRi = the total amount of halogenated HAP solvent removed from the solvent cleaning machine in solid waste, obtained as described in 8.10.3.1.3 of this regulation, during the most recent month i, (kilograms per month).
(8-11) |
where:
ETunit = the 12-month rolling total halogenated HAP solvent emissions from the solvent cleaning machine for the most recent 12 months, (kilograms per 12-month period).
Eunit = the total halogenated HAP solvent emissions from the solvent cleaning machine for each month, j, for the most recent 12 months (kilograms per month).
(8-12) |
where:
ETfacility = the facility-wide 12-month rolling total halogenated HAP solvent emissions for the most recent 12 months from all solvent cleaning machines that are part of the affected facility, (kilograms per 12-month period).
ETunit = the 12-month rolling total halogenated HAP solvent emissions from the solvent cleaning machine for the most recent 12 months for each solvent cleaning machine, j, (kilograms per 12-month period).
i = the total number of solvent cleaning machines that are part of the affected facility subject to the provisions of 8.10 of this regulation.
In addition to the recordkeeping requirements of 8.8 of this regulation, each owner or operator of an affected facility shall maintain records specified in 8.10.4.1 through 8.10.4.5 of this regulation in either electronic or written form for a period of five years.
Each owner or operator of an affected facility shall submit a solvent emission report every year. The owner or operator shall submit the solvent emissions report by February 1 of the year following the one for which the reporting is being made. This solvent emission report shall include the information specified in 8.10.6.1 through 8.10.6.7 of this regulation.
Upon written application to the Administrator (with copy to the Department), the Administrator may approve the use of equipment or procedures after they have been satisfactorily demonstrated to be equivalent, in terms of reducing emissions of methylene chloride, perchloroethylene, trichloroethylene, 1,1,1-trichloroethane, carbon tetrachloride or chloroform to the atmosphere, to those prescribed for compliance within a specified provision of 8.0 of this regulation. The application must contain a complete description of the equipment or procedure and the proposed equivalency testing procedure and the date, time, and location scheduled for the equivalency demonstration.
Table 8-8 - Applicability of 8.0 to 3.0 of this Regulation
General | Applies to 8.0 | Comments | |
Provisions | |||
Reference | BCC | BVI | |
3.1.1.1 - 3.1.1.3 | Yes | Yes | |
3.1.1.4 | Yes | Yes | Table 8-8 specifies applicability of each provision in 3.0 to 8.0. |
3.1.1.5 | No | No | |
3.1.1.6 | Yes | Yes | |
3.1.1.7 - 3.1.1.9 | No | No | |
3.1.1.10 | Yes | Yes | |
3.1.1.11 | No | No | 8.0 allows submittal of notifications and reports through the U.S. mail, fax, and courier. 8.0 requires that the postmark for notifications and reports submitted through the U.S. mail or other non-Governmental mail carriers be on or before deadline specified in an applicable requirement. |
3.1.1.12 - 3.1.1.14 | Yes | Yes | |
3.1.2.1 | No | No | 8.0 specifies applicability. |
3.1.2.2 | No | No | |
3.1.2.3 | Yes | Yes | |
3.1.3.1 | Yes | Yes | |
3.1.3.2 | Yes | Yes | 8.1.8 exempts area sources subject to 8.0 from the obligation to obtain a Title V operating permit. |
3.1.3.3 | No | No | |
3.1.3.4 | No | No | |
3.1.3.5 | Yes | Yes | 8.0 does not require continuous monitoring systems (CMS) or continuous opacity monitoring systems (COMS). Therefore, notifications and requirements for CMS and COMS specified in 3.0 do not apply to 8.0. |
3.1.4 | No | No | |
3.1.5 | Yes | Yes | |
3.2 | Yes | Yes | 8.0 definitions (8.2) for existing and new overlap with the definitions for existing source and new source in 3.2. Both 3.0 and 8.0 also define Administrator. |
3.3.1 - 3.3.3 | Yes | Yes | |
3.4.1.1 - 3.4.1.2 | Yes | Yes | |
3.4.1.3 - 3.4.1.5 | No | No | |
3.4.2 - 3.4.3 | Yes | Yes | |
3.5.1.1 | Yes | Yes | |
3.5.1.2 | Yes | Yes | |
3.5.2.1 | Yes | Yes | |
3.5.2.2 | No | No | |
3.5.2.3 - 3.5.2.4 | Yes | Yes | |
3.5.2.5 | No | No | |
3.5.2.6 | Yes | Yes | |
3.5.3 | No | No | |
3.5.4 - 3.5.4.1.2.6 | Yes | Yes | |
3.5.4.1.2.7 | No | No | |
3.5.4.1.2.8 | Yes | Yes | |
3.5.4.1.2.9 | No | No | |
3.5.4.1.2.10 - 3.5.6 | Yes | Yes | |
3.6.1 | Yes | Yes | |
3.6.2.1 - 3.6.2.5 | Yes | Yes | 8.1 specifies compliance dates. |
3.6.2.6 | No | No | |
3.6.2.7 | No | No | 8.0 has the same requirements for affected halogenated HAP solvent cleaning machine subcategories that are located at area sources as it does for those located at major sources |
3.6.3.1 - 3.6.3.2 | Yes | Yes | |
3.6.3.3 - 3.6.3.4 | No | No | |
3.6.3.5 | Yes | Yes | 8.0 has the same requirements for affected halogenated HAP solvent cleaning machine subcategories that are located at area sources as it does for those located at major sources. |
3.6.4 | No | No | |
3.6.5.1 | Yes | Yes | |
3.6.5.2 | No | No | |
3.6.5.3 | No | No | 8.0 overrides the requirement of a startup, shutdown, and malfunction plan. 8.0 specifies startup and shutdown procedures to be followed by an owner or operator for batch vapor and in-line cleaning machines. |
3.6.6 - 3.6.7 | Yes | Yes | |
3.6.8 | No | No | 8.0 does not require compliance with an opacity or visible emission standard. |
3.6.9.1 - 3.6.9.14 | Yes | Yes | |
3.6.9.15 | No | No | |
3.6.9.16 | Yes | Yes | |
3.6.10 | Yes | Yes | |
3.7.1 - 3.7.1.2 | No | Yes | 8.0 gives owners or operators the option to perform an idling emission performance test as a way of demonstrating compliance. Other options are also available that do not require a performance test. |
3.7.1.2.1 - 3.7.1.2.8 | No | No | |
3.7.1.2.9 - 3.7.1.3 | No | Yes | |
3.7.2 | No | Yes | This is only required for those owners or operators that choose the idling emission standard as their compliance option. |
3.7.3.1 | No | Yes | This is only required for those owners or operators that choose the idling emission standard as their compliance option. |
3.7.3.2 - 3.7.3.3 | No | No | 8.0 does not require a site-specific test plan for the idling emission performance test. |
3.7.3.4 | No | No | 8.0 does not require a performance test that involves the retrieval of gas samples, and therefore this does not apply. |
3.7.4 | No | No | Requirements do not apply to the idling emission performance test option. |
3.7.5 | No | Yes | |
3.7.6 | No | Yes | |
3.7.7 - 3.7.7.1 | No | Yes | 8.0 specifies what is required to demonstrate idling emission standard compliance through the use of Method 307 in Appendix A of 40 CFR Part 63 and control device monitoring. Reports and records of testing and monitoring are required for compliance verification. Three runs of the test are required for compliance, as specified in 3.7.5 |
3.7.7.2 | No | No | |
3.7.7.3 | No | Yes | |
3.7.8 | No | No | 8.0 does not require the use of a performance test to comply with the standard. The idling emission standard option (which requires an idling emission performance test) is an alternative option offered to owners or operators of batch vapor and in-line cleaning machines for compliance flexibility. |
3.8.1.1 - 3.8.1.2 | Yes | Yes | |
3.8.1.3 | No | No | |
3.8.1.4 - 3.8.2 | Yes | Yes | |
3.8.3 - 3.8.5 | No | No | 8.0 does not require the use of continuous monitoring systems to demonstrate compliance. |
3.8.6 | Yes | Yes | |
3.8.7 | No | No | 8.0 does not require continuous opacity monitoring systems and continuous monitoring systems data. |
3.9.1.1 - 3.9.1.4 | Yes | Yes | |
3.9.2.1 | Yes | Yes | |
3.9.2.2 | Yes | Yes | 8.9 includes all of those requirements stated in 3.0, except that 3.0 also requires a statement as to whether the affected source is a major or an area source, and an identification of the relevant standard (including the source's compliance date). 8.9.1 and 8.9.2 also includes more specific information requirements specific to the affected source (see 8.9.1 and 8.9.2). 8.10.5.1 includes all initial notification requirements for affected facilities subject to a facility-wide 12-month rolling total halogenated HAP solvent emission limit. |
3.9.2.3 | No | No | |
3.9.2.4 - 3.9.2.4.1 | Yes | Yes | |
3.9.2.4.2 - 3.9.2.4.4 | No | No | |
3.9.2.4.5 | Yes | Yes | |
3.9.2.5 | Yes | Yes | |
3.9.3 | Yes | Yes | |
3.9.4 | Yes | Yes | |
3.9.5 | Yes | Yes | Under 8.0, this requirement only applies to owners or operators choosing to comply with the idling emissions standard. |
3.9.6 | No | No | 8.0 does not require opacity or visible emission observations. |
3.9.7 | No | No | 8.0 does not require the use of continuous monitoring systems or continuous opacity monitoring systems. |
3.9.8 | No | No | 8.9.3 through 8.9.5 include all initial statement of compliance requirements for affected sources. For existing sources, this statement is to be submitted to the Department no later than November 11, 2001. For new sources, this statement is to be submitted to the Department no later than 150 days after startup or November 11, 2001, whichever is later. 8.10.5.2 includes all initial statement of compliance requirements for affected facilities subject to a facility-wide 12-month rolling total halogenated HAP solvent emission limit. |
3.9.9 | Yes | Yes | |
3.9.10 | Yes | Yes | |
3.10.1 | Yes | Yes | |
3.10.2.1 - 3.10.2.2 | No | No | Recordkeeping requirements are specified in 8.0. |
3.10.2.3 | Yes | Yes | |
3.10.3.1 - 3.10.3.15 | No | No | 8.0 does not require continuous monitoring systems. |
3.10.4.1 | Yes | Yes | |
3.10.4.2 - 3.10.4.5 | No | No | Reporting requirements are specified in 8.0. |
3.10.5.1 - 3.10.5.2 | No | No | 8.0 does not require continuous emissions monitoring systems. |
3.10.5.3 | No | No | 8.0 does not require continuous monitoring systems. |
3.10.5.4 | No | No | 8.0 does not require continuous opacity monitoring systems. |
3.10.6 | Yes | Yes | |
3.11.1 | Yes | Yes | |
3.11.2 | No | No | Flares are not a control option under 8.0 |
3.12.1 - 3.12.3 | Yes | Yes | |
3.13.1 - 3.13.3 | Yes | Yes | |
3.14 | No | No | 8.0 requirements do not require the use of the test methods incorporated by reference in 3.0. |
3.15.1 - 3.15.2 | Yes | Yes |
BCC = Batch Cold Cleaning Machines.
BVI = Batch Vapor and In-line Cleaning Machines.
7 Del. Admin. Code § 1138-8.0
19 DE Reg. 311 (10/1/2015) (Final)