Where:
PR = Percent reduction.
Eunc = Mass rate of total organic HAP for uncontrolled batch emission episode i, kg/hr.
Einlet, con = Mass rate of total organic HAP for controlled batch emission episode i at the inlet to the control device, kg/hr.
R = Control efficiency of control device as specified in paragraphs (e)(1)(iii)(A) through (e)(1)(iii)(C) of this section. The value of R may vary between batch emission episodes.
n = Number of uncontrolled batch emission episodes, controlled batch emission episodes, and control devices. The value of n is not necessarily the same for these three items.
Where:
ER = Emission rate of organic HAP from reactor batch process vents, kg of HAP/Mg product.
Ei = Emission rate of organic HAP from reactor batch process vent i as determined using the procedures specified in paragraph (e)(2)(i)(C)(1) of this section, kg/month.
RPm = Amount of resin produced in one month as determined using the procedures specified in paragraph (e)(2)(i)(C)(4) of this section, Mg/month.
n = Number of batch process vents.
Where:
Ei = Monthly emissions from a batch process vent, kg/month.
Ni = Number of type i batch cycles performed monthly, cycles/month.
Ecyclei = Emissions from the batch process vent associated with a single type i batch cycle, as determined using the procedures specified in either paragraph (e)(2)(i)(C)(2) or (3) of this section, kg/batch cycle.
n = Number of different types of batch cycles that cause the emission of organic HAP from the batch process vent.
Where:
SSEL = Site specific emission limit, kg of organic HAP/Mg of product.
MGs = Megagrams of solvent-based resin product produced, megagrams.
MGns = Megagrams of non-solvent-based resin product produced, megagrams.
ELs = Emission limit for solvent-based resin product, kg organic HAP/Mg solvent-based resin product.
ELns = Emission limit for non-solvent-based resin product, kg organic HAP/Mg non-solvent-based resin product.
Where:
ER = Emission rate of organic HAP from continuous process vent, kg of HAP/Mg product.
Ei = Emission rate of organic HAP from continuous process vent i as determined using the procedures specified in paragraph (h)(3)(ii) of this section, kg/day.
RPm = Amount of resin produced in one month as determined using the procedures specified in paragraph (h)(3)(iii) of this section, Mg/day.
Where:
EH = Hourly emission rate of organic HAP in the sample, kilograms per hour.
K2 = Constant, 2.494 * 10-6 (parts per million)-1 (gram-mole per standard cubic meter) (kilogram/gram) (minutes/hour), where standard temperature for (gram-mole per standard cubic meter) is 20 °C.
n = Number of components in the sample.
CJ = Organic HAP concentration on a dry basis of organic compound j in parts per million as determined by the methods specified in paragraph (h)(4)(ii) of this section.
Mj = Molecular weight of organic compound j, gram/gram-mole.
QS = Continuous process vent flow rate, dry standard cubic meters per minute, at a temperature of 20 °C, as determined by the methods specified in paragraph (h)(4)(ii) of this section.
Where:
AE = Average hourly emission rate per operating day, kilograms per hour.
n = Number of hours in the operating day.
40 C.F.R. §63.1413