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Code of Federal Regulations
Title 40 - PROTECTION OF ENVIRONMENTChapter I - ENVIRONMENTAL PROTECTION AGENCYSubchapter C - AIR PROGRAMSPart 63 - NATIONAL EMISSION STANDARDS FOR HAZARDOUS AIR POLLUTANTS FOR SOURCE CATEGORIES
Subpart MMM - NATIONAL EMISSION STANDARDS FOR HAZARDOUS AIR POLLUTANTS FOR PESTICIDE ACTIVE INGREDIENT PRODUCTION
Appendix Table 2 to Subpart MMM of Part 63 - Standards for New and Existing PAI Sources

40 C.F.R. § 63 app Table 2 to Subpart MMM of Part 63

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Current through May 31, 2024
Appendix Table 2 to Subpart MMM of Part 63 - Standards for New and Existing PAI Sources

Emission source Applicability Requirement
Process ventsExisting:
Processes having uncontrolled organic HAP emissions [GREATER THAN EQUAL TO]0.15 Mg/yr90% for organic HAP per process or to outlet concentration of [LESS THAN EQUAL TO]20 ppmv TOC.
Processes having uncontrolled HCl and chlorine emissions [GREATER THAN EQUAL TO]6.8 Mg/yr94% for HCl and chlorine per process or to outlet HCl and chlorine concentration of [LESS THAN EQUAL TO]20 ppmv.
Individual process vents meeting flow and mass emissions criteria that have gaseous organic HAP emissions controlled to less than 90% on or after November 10, 199798% gaseous organic HAP control per vent or [LESS THAN EQUAL TO]20 ppmv TOC outlet limit.
New:
Processes having uncontrolled organic HAP emissions [GREATER THAN EQUAL TO]0.15 Mg/yr98% for organic HAP per process or [LESS THAN EQUAL TO]20 ppmv TOC.
Processes having uncontrolled HCl and chlorine emissions [GREATER THAN EQUAL TO]6.8 Mg/yr and [LESS THAN]191 Mg/yr94% for HCl and chlorine per process or to outlet concentration of [LESS THAN EQUAL TO]20 ppmv HCl and chlorine.
Processes having uncontrolled HCl and chlorine emissions [GREATER THAN EQUAL TO]191 Mg/yr99% for HCl and chlorine per process or to outlet concentration of [LESS THAN EQUAL TO]20 ppmv HCl and chlorine.
Storage vesselsExisting: [GREATER THAN EQUAL TO]75 m3 capacity and vapor pressure [GREATER THAN EQUAL TO]3.45 kPaInstall a floating roof, reduce HAP by 95% per vessel, or to outlet concentration of [LESS THAN EQUAL TO]20 ppmv TOC.
New: [GREATER THAN EQUAL TO]38 m3 capacity and vapor pressure [GREATER THAN EQUAL TO]16.5 kPaSame as for existing sources.
[GREATER THAN EQUAL TO]75 m3 capacity and vapor pressure [GREATER THAN EQUAL TO]3.45 kPaSame as for existing sources.
WastewateraExisting: Process wastewater with [GREATER THAN EQUAL TO]10,000 ppmw Table 9 compounds at any flowrate or [GREATER THAN EQUAL TO]1,000 ppmw Table 9 compounds at [GREATER THAN EQUAL TO]10 L/min, and maintenance wastewater with HAP load [GREATER THAN EQUAL TO]5.3 Mg per discharge eventReduce concentration of total Table 9 compounds to [LESS THAN]50 ppmw (or other options).
New:
Same criteria as for existing sourcesReduce concentration of total Table 9 compounds to [LESS THAN]50 ppmw (or other options).
Total HAP load in wastewater POD streams [GREATER THAN EQUAL TO]2,100 Mg/yr.99% reduction of Table 9 compounds from all streams.
Equipment leaksSubpart HSubpart H with minor changes, including monitoring frequencies consistent with the proposed CAR.
Product dryers and bag dumpsDryers used to dry PAI that is also a HAP, and bag dumps used to introduce feedstock that is a solid and a HAPParticulate matter concentration not to exceed 0.01 gr/dscf.
Heat exchange systemsEach heat exchange system used to cool process equipment in PAI manufacturing operationsMonitoring and leak repair program as in HON.

a Table 9 is listed in the appendix to subpart G of 40 CFR part 63.

40 C.F.R. 63 app Table 2 to Subpart MMM of Part 63