Murata Manufaduring Co., Ltd.Download PDFPatent Trials and Appeals BoardOct 27, 20212021001518 (P.T.A.B. Oct. 27, 2021) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 15/960,917 04/24/2018 Mitsunori Inoue 036433.03950 2792 38485 7590 10/27/2021 ARENT FOX LLP - New York 1717 K Street, NW Washington, DC 20006-5344 EXAMINER BARNES, MALCOLM ART UNIT PAPER NUMBER 2837 NOTIFICATION DATE DELIVERY MODE 10/27/2021 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): patentdocket@arentfox.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte MITSUNORI INOUE and TOMOHIKO MORI Appeal 2021-001518 Application 15/960,917 Technology Center 2800 Before BEVERLY A. FRANKLIN, JEFFREY B. ROBERTSON, and N. WHITNEY WILSON, Administrative Patent Judges. ROBERTSON, Administrative Patent Judge. DECISION ON APPEAL1 STATEMENT OF THE CASE Pursuant to 35 U.S.C. § 134(a), Appellant appeals from the Examiner’s decision to reject claims 1–11.2 Appeal Br. 3. We have jurisdiction under 35 U.S.C. § 6(b). We reverse. 1 This Decision includes citations to the following documents: Specification filed April 24, 2018 (“Spec.”); Final Office Action entered March 5, 2020 (“Final Act.”); Appeal Brief filed July 31, 2020 (“Appeal Br.”); Examiner’s Answer entered November 16, 2020 (“Ans.”), and Reply Brief filed December 23, 2020 (“Reply Br.”). 2 We use the term “Appellant” to refer to “applicant” as defined in 37 C.F.R. § 1.42. Appellant identifies Murata Manufacturing Co., Ltd. as the real party in interest. Appeal Br. 2. Appeal 2021-001518 Application 15/960,917 2 CLAIMED SUBJECT MATTER Appellant states the invention relates to a ceramic electronic component and a method for manufacturing the component. Spec. ¶ 2. Claim 1 is reproduced below, and is illustrative of the claimed subject matter (Appeal Br. 11, Claims App.): 1. A method for manufacturing a ceramic electronic component, the method comprising: providing, to a surface of a ceramic element, a resin- containing solution that etches the surface of the ceramic element so as to ionize constituent elements of the ceramic element to form a resin composition comprising a resin and a cationic element that is a constituent element of the ceramic element, the resin composition at least partially filling voids of the ceramic element and at an interface between the ceramic element and an electrode. REFERENCES The prior art relied upon by the Examiner is: Name Reference Date Heistand, II et al. (“Heistand”) US 2001/0035810 A1 Nov. 1, 2001 Sekharan et al. (“Sekharan”) US 2008/0160199 A1 July 3, 2008 Riho et al. (“Riho”) JP 10-208907, English Translation of Record Aug. 7, 1998 REJECTIONS 1. Claims 1–5, 7–9, and 11 are rejected under 35 U.S.C. § 103 as being unpatentable over Riho and Sekharan. Final Act. 4–7. 2. Claims 5 and 6 are rejected under 35 U.S.C. § 103 as being unpatentable over Riho and Sekharan. Final Act. 8–9. Appeal 2021-001518 Application 15/960,917 3 3. Claim 10 is rejected under 35 U.S.C. § 103 as being unpatentable over Riho, Sekharan, and Heistand. Final Act. 10. OPINION Rejection 1 We confine our discussion to claim 1, which is sufficient for disposition of this rejection. The Examiner’s Rejection In rejecting claim 1 as unpatentable over Riho and Sekharan, the Examiner found that Riho discloses a method for manufacturing a ceramic electronic component including providing a resin-containing solution (silicone resin or silicone resin mixed with metal alkoxide) to the surface of a ceramic element to at least partially fill the voids of the ceramic element. Final Act. 4–5. The Examiner found Riho does not explicitly teach the resin-containing solution etches the surface of the ceramic element to ionize the constituent elements of the ceramic element and a cationic element that is a constituent element of the ceramic element. Id. at 5. The Examiner found Sekharan discloses a resin-containing solution that etches the surface of a ceramic element forming a cationic element, such as iron and zinc, from the surface of a metal substrate. Final Act. 5. The Examiner concluded it would have been obvious to have modified Riho to include the teachings of Sekharan in order to etch the surface of the ceramic element to cause the dissolution of active metals and form a coating to eliminate pinholes. Final Act. 5, citing Sekharan ¶¶ 42, 58. Appeal 2021-001518 Application 15/960,917 4 Appellant’s Arguments Appellant argues that Riho’s silicone resin or varnish does not contain a cationic element that was etched from the ceramic element. Appeal Br. 5. Appellant contends one of ordinary skill would not look to Sekharan to modify Riho because Sekharan is directed to an autodeposition bath for metals in order to solve the problem of pinholes in the coatings of deposited metals. Id. at 7–9. As a result, Appellant argues Sekharan is not concerned with pinholes in the surface of the metal (corresponding to the “voids of the ceramic element” recited in claim 1). See id. at 9. Appellant argues Sekharan does not disclose that the autodeposition bath disclosed therein may be used or can be used to etch the surface of a ceramic element to ionize constituent elements of the ceramic element to form a resin composition comprising a resin and a cationic element. Id. Therefore, Appellant contends one of ordinary skill in the art would have no reason to combine Riho and Sekharan absent impermissible hindsight. Id. Discussion After careful review of the respective positions of the Examiner and Appellant, we are persuaded that the Examiner erred in rejecting claim 1 as obvious over the combination of Riho and Sekharan. In particular, we are of the view that the Examiner did not articulate a sufficient reason to modify Riho’s method with Sekharan to render claim 1 obvious. Sekharan discloses a method for aqueous autodeposition for coating non-ferrous metal substrates to reduce pinhole formation in the autodeposited coatings. Sekharan ¶ 2. Sekharan discloses pinholes are a problem in autodeposited coatings due to non-ferrous metal surfaces that are Appeal 2021-001518 Application 15/960,917 5 more reactive toward the coating bath than ferrous metals, which results in higher hydrogen gas evolution and pinhole defects in the coating. Id. ¶¶ 7, 8. Sekharan discloses an autodeposition method aimed at reducing such pinhole defects by controlling the hydrogen peroxide concentration of the autodeposition bath. Id. ¶¶ 9–19, 41, 42. Sekharan discloses its method “can be utilized in any metal treatment process where hydrogen evolution is a concern for the quality of the coating process.” Id. ¶ 53. As discussed above, the Examiner’s rationale for combining Riho and Sekharan is based on Sekharan’s disclosure that causing the dissolution of active metals from the surface of a metal substrate in contact with the bath composition eliminates pinholes from the resulting coating. Final Act. 5. The Examiner’s reasoning is not based on sufficient rational underpinnings3 because, as the Examiner acknowledges, Riho does not disclose a method where a resin-containing solution is used so as to ionize constituent elements of the ceramic element and a cationic element. Id.; Ans. 4, 6; see Riho ¶ 13 (disclosing coating the outer surface of an element body with an impregnating solution and curing the organic substance in the impregnating solution). In other words, Riho does not disclose an autodeposition process involving metals, nor does Riho disclose that its coating method is subject to hydrogen gas evolution that may cause pinholes in the resulting coating, which is the problem identified in Sekharan. 3 “‘[R]ejections on obviousness grounds cannot be sustained by mere conclusory statements; instead, there must be some articulated reasoning with some rational underpinning to support the legal conclusion of obviousness.’” KSR Int’l. Co. v. Teleflex Inc., 550 U.S. 398, 418 (2007), quoting In re Kahn, 441 F.3d 977, 988 (Fed. Cir. 2006). Appeal 2021-001518 Application 15/960,917 6 Thus, the Examiner does not sufficiently explain why one of ordinary skill in the art would have utilized the method in Sekharan to modify Riho in order to obtain a method that would result in a resin-containing solution partially filling voids in a ceramic element as recited in claim 1. Therefore, the Examiner’s position is insufficient to establish that one of ordinary skill in the art would have turned to Sekharan to modify Riho in a manner that would have rendered claim 1 obvious. See Appeal Br. 8–9; Reply Br. 4–6. As a result, we reverse the Examiner’s decision to reject claim 1 as obvious over Riho and Sekharan. Rejections 2 and 3 Claims 5, 6, and 10, the subject of Rejections 2 and 3, depend either directly or indirectly from claim 1. The additional citation to Heistand in order to reject claim 10 does not remedy the deficiencies discussed above with respect to the combination of Riho and Sekharan. Accordingly, we reverse Rejections 2 and 3 for similar reasons as discussed above for Rejection 1. Appeal 2021-001518 Application 15/960,917 7 DECISION SUMMARY In summary: Claim(s) Rejected 35 U.S.C. § Reference(s)/Basis Affirmed Reversed 1–5, 7–9, 11 103 Riho, Sekharan 1–5, 7–9, 11 5, 6 103 Riho, Sekharan 5, 6 10 103 Riho, Sekharan, Heistand 10 Overall Outcome 1–11 REVERSED Copy with citationCopy as parenthetical citation