Kyojiro KanekoDownload PDFPatent Trials and Appeals BoardApr 28, 202013510386 - (D) (P.T.A.B. Apr. 28, 2020) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 13/510,386 05/17/2012 Kyojiro Kaneko 1929-009B-US 6234 31855 7590 04/28/2020 PHILIP O. POST INDEL, INC. PO BOX 157 RANCOCAS, NJ 08073 EXAMINER BRATLAND JR, KENNETH A ART UNIT PAPER NUMBER 1714 MAIL DATE DELIVERY MODE 04/28/2020 PAPER Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE PATENT TRIAL AND APPEAL BOARD ____________ Ex parte KYOJIRO KANEKO Appeal 2019-006538 Application 13/510,386 Technology Center 1700 ____________ Before MICHAEL P. COLAIANNI, CHRISTOPHER C. KENNEDY, and DEBRA L. DENNETT, Administrative Patent Judges. COLAIANNI, Administrative Patent Judge. DECISION ON APPEAL Pursuant to 35 U.S.C. § 134(a), Appellant1 appeals from the Examiner’s decision to reject claims 1, 4–12, and 14–17. We have jurisdiction under 35 U.S.C. § 6(b). We AFFIRM IN PART. 1 We use the word “Appellant” to refer to “applicant” as defined in 37 C.F.R. § 1.42. Appellant identifies the real party in interest as Consarc Corporation. Appeal Br. 3. Appeal 2019-006538 Application 13/510,386 2 Appellant’s invention is directed to a silicon electromagnetic casting apparatus used to manufacture silicon ingots for silicon substrates used mainly in solar cells (Spec. ¶ 1; Claim 1). Claim 1 is representative of the subject matter on appeal: 1. A silicon electromagnetic casting apparatus comprising a furnace vessel, a conductive crucible installed within the furnace vessel and an induction coil element installed around the outer circumference of the conductive crucible, wherein a constant pressure is maintained within the furnace vessel using a prescribed gas and a silicon in the conductive crucible is moved downwards along the center line of the furnace vessel, and melted by induction heating by applying a terminal voltage to the induction coil element to form a molten silicon, and thereafter the molten silicon is solidified at a solidification interface; characterized in that the induction coil element comprises a plurality of induction coils of different induction frequencies arranged one above another from a lowest-disposed induction coil to a highest-disposed induction coil in which the silicon in the crucible is melted by induction heating, wherein among the plurality of induction coils of different induction frequencies, the highest-disposed induction coil is positioned above the solidification interface to stir the molten silicon and the lowest-disposed induction coil is positioned at the solidification interface, the lowest- disposed induction coil having a high induction frequency of at least 25 kHz, with which high induction frequency the stirring effect on the molten silicon is low at the solidification interface and a static state of the molten silicon is maintained at the solidification interface. Appellant appeals the following rejections: 1. Claims 1, 5, 6, and 12 are rejected under 35 U.S.C. § 103 as unpatentable over Kaneko (US 2007/0039544 A1; pub. Feb. 22, 2007) in view of Kaneko II (US 4,915,723; iss. Apr. 10, 1990). 2. Claims 4, 8, 10, 14 are rejected under 35 U.S.C. § 103 as unpatentable over Kaneko in view of Kaneko II, Mosch (US Appeal 2019-006538 Application 13/510,386 3 5,066,223; iss. Nov. 19, 1991), or Kim (KR 1999-0052121; pub. July 05, 1999). 3. Claims 7 and 17 are rejected under 35 U.S.C. § 103 as unpatentable over Kaneko in view of Kaneko II, and Aratani (US 5,510,095; iss. Apr. 23, 1996). 4. Claims 9 and 11 are rejected under 35 U.S.C. § 103 as unpatentable over Kaneko in view of Kaneko II, Mosch, Kim and Aratani. 5. Claims 15 and 16 are rejected under 35 U.S.C. § 103 as unpatentable over Kaneko in view of Kaneko II, Sasatani (US 2008/0210156 A1; pub. Sept. 04, 2008). FINDINGS OF FACT & ANALYSIS Rejection 1 Appellant argues independent claim 1 and 12 separately (Appeal Br. 11 and 16). Appellant’s argument regarding dependent claims 5 and 6 rely on arguments made regarding claim 1 (Appeal Br. 15). Therefore, claims 5 and 6 will stand or fall with claim 1. Claim 1 The Examiner’s findings and conclusions regarding the § 103 rejection of claim 1 over Kaneko in view of Kaneko II are located on pages 2 to 6 of the Non-Final Action. Appeal 2019-006538 Application 13/510,386 4 Appellant argues that Kaneko II uses heating means 24 to apply heat to a solidified silicon ingot to prevent a thermal strain due to sudden cooling (Appeal Br. 13). Appellant argues that Kaneko II has three inductively heated zones: (1) the zone with coil 7 where the silicon is melted, (2) the zone after the melt where solidification begins and (3) the zone where solidified silicon is heated by heating means 24 (Appeal Br. 12). Appellant contends that there is no basis, absent impermissible hindsight, for using Kaneko II”s teachings within a zone of molten silicon in light of Kaneko II’s teaching to apply the heater 24 having the second coil 31 to a solidified silicon ingot (Appeal Br. 12, 13). Appellant contends that Kaneko II’s second induction coil 31 as shown in Figure 3B and Figure 4 is positioned around the solidified silicon ingot and not near the molten induction heating zone or the solidification interface heating zone (Appeal Br. 14). Appellant argues that because Kaneko II places the coil 31 around a solidified silicon ingot, there is no merit in the Examiner’s position that there is no change in the respective function of the coils (Appeal Br. 14). Appellant contends that there is no teaching or suggestion in Kaneko II to operate coils 7 and 31 in the Figure 3B embodiment at different frequencies (Appeal Br. 14). Claim 1 is an apparatus claim. As an apparatus claim, the claims cover what the device is, not what the device does. Hewlett-Packard Co. V. Bausch & Lomb Inc., 909 F.2d 1464, 1469 (Fed. Cir. 1990). A claim reciting the manner in which an apparatus is to be used does not differentiate a claim from the prior art if all structural limitations are taught by the prior art. Ex parte Masham, 2 USPQ2d 1647 (BPAI 1987). The Examiner reasonably finds that a person of ordinary skill in the art would have combined Kaneko II’s dual coil structure in an induction Appeal 2019-006538 Application 13/510,386 5 casting furnace for making silicon ingots with Kaneko’s induction furnace to provide greater control over axial temperature gradients within the molten zone and/or solidified ingot during crystal growth (Non-Final Act. 6). Appellant’s argument regarding the positioning of Kaneko II’s lower coil 31 over the solidified portion of the silicon ingot does not patentably distinguish the claimed apparatus structure over the structure suggested by the combination of Kaneko and Kaneko II. Appellant does not direct us to any teachings that would structurally distinguish Kaneko II’s lower coil 31 from the claimed lowest disposed induction coil. In other words, the Examiner reasonably finds Kaneko’s structure as modified by Kaneko II’s teachings would have been capable of applying a high induction frequency to the lower induction coil (i.e., 31) that suppresses stirring of the silicon melt. In re Schreiber, 128 F.3d 1473, 1478 (Fed. Cir. 1997) (The court found that based on the identity of the oil can structure, it was functionally capable of performing the claimed function (i.e., dispensing popcorn kernels) absent evidence that the can was not capable of such a function). Appellant’s argument that Kaneko II positions of the lower coil around the solidified portion of the silicon ingot is directed to the process used in the apparatus. Stated differently, the apparatus of Kaneko as modified by Kaneko II would be capable positioning the solid ingot so that the solid/melt portion of the ingot in the apparatus is aligned with the second coil. The location of the melt/solid line in the silicon ingot is a function of how the coils are used (i.e., frequency applied, duration, etc.). The Examiner finds that Kaneko II teaches that inductor coils 7 and 31 may be controlled independently of one another (Ans. 5). We agree with the Appeal 2019-006538 Application 13/510,386 6 Examiner that independent control would have suggested that coils 7 and 31 are capable of having different frequencies applied to them (Ans. 5). Based on the Examiner’s finding of capability, the burden shifted to Appellant to show that Kaneko’s structure as modified by Kaneko II’s dual coil system would not have been capable of performing the recited function (i.e., operating at different frequencies so that they are positioned at the melt/solid silicon interface). Schreiber, 128 F.3d at 1478. Appellant’s arguments have not satisfied that burden. We affirm the rejection of claims 1, 5, and 6. Claim 12 The Examiner’s finding and conclusions regarding claim 12 are located on pages 6 to 10 of the Non-Final Action. As with claim 1, the Examiner finds that Kaneko teaches the features of process claim 12 but fails to teach the induction coil is comprised of a plurality of induction coils and applying a terminal voltage in the claimed manner (Non-Final Act. 7). The Examiner finds that Kaneko II teaches arranging two coils (i.e., coils 7 and 31) above one another and operating the coil 7 at 20 kHz or 30 kHz and Kaneko teaches performing crystal growth at an induction frequency of 30 kHz (Non-Final Act. 8). The Examiner finds that Kaneko and Kaneko II teach that induction frequency is a result effective variable that would have been readily optimized (Non-Final Act. 9–10). The Examiner concludes that it would have been obvious to combine Kaneko II’s dual induction coil heating system in a silicon ingot furnace with Kaneko’s silicon ingot induction furnace and to provide the coils with different induction frequencies to better control temperature gradients in the melt (Non-Final Appeal 2019-006538 Application 13/510,386 7 Act. 9–10). The Examiner finds that the optimal relative induction coil frequency for the upper and lower coil in the method of Kaneko as modified by Kaneko II would have been readily optimized for the heating process to produce desired temperature gradients (Non-Final Act. 10). The Examiner cites KSR International Co. v. Teleflex Inc., 550 US 398, 416 (2007) and finds that all the claimed elements are known in the prior art and a person of ordinary skill in the art would have combined the elements as claimed by known methods with no change in their respective functions, yielding no more than predictable results (Non-Final Act. 10). Appellant argues that Kaneko does not teach maintaining a static state of the molten silicon during production of the silicon ingot from the molten silicon as disclosed and claimed in the process claims (Appeal Br. 16). Appellant contends that contrary to the Examiner’s conclusory finding that Kaneko’s process is at steady state, Kaneko discloses that coil 2 stirs and moves the molten material and does not maintain a static state at the melt/solid interface (Appeal Br. 16). Appellant argues that Kaneko II applies heat from the lower heater 24 to a solidified silicon ingot (Appeal Br. 16). Appellant contends that Kaneko II is silent about the induction frequency of the second induction coil 31 and the relative power frequencies of coil 7 and coil 31 since the heating process of coil 7 and coil 31 are not related in Kaneko II (Appeal Br. 17). Appellant argues that in Kaneko II coil 7 is used for heating and stirring molten silicon and coil 31 is used for controlled axial gradient heating of the solidified silicon ingot unlike claim 12 that requires the lower induction coil has a high frequency applied to suppress stirring of the molten silicon (Appeal Br. 17). Appellant argues that Kaneko II does not teach that the operating frequencies of the induction Appeal 2019-006538 Application 13/510,386 8 coils are result effective variables for suppressing the stirring of molten silicon at the solidification interface and maintaining a static state of the molten silicon at the solidification interface (Appeal Br. 17). Appellant argues that routine optimization of the induction coil frequencies in Kaneko II would optimize the separate control of the melting silicon with the separate control of the axial temperature gradient of the cast ingot formed after silicon melting and solidification of the cast ingot (Appeal Br. 18). Appellant argues that the Examiner engaged in impermissible hindsight in concluding that the subject matter of claim 12 would have been obvious over Kaneko and Kaneko II (Appeal Br. 18). We agree. The Examiner has not shown why one of ordinary skill in the art would have optimized the induction frequency of Kaneko II’s lower coil 31 to be at least 25 kHz as required by the process step in claim 12. As argued by Appellant, Kaneko II teaches that the lower coil 31 of heater 24 is used to anneal solidified silicon (Kaneko II, col. 9, ll. 50–53, col. 10, ll. 14–18). Kaneko II further discloses that the heating means 24 is disposed downstream of the described boundary surface B in Figure 4 (col. 4, ll. 37– 42, 47–49). See also, Kaneko II Figure 3B. Kaneko II discloses that Figure 4 shows that the boundary surface B between molten and solid silicon is within the first induction coil 7 (col. 4, ll. 9–11). Kaneko II further discloses that “solidified silicon 12 is pulled down from inside of the bottomless crucible 6 while its temperature gradually falls.” (col. 4, ll. 11–13). In light Kaneko II’s teachings, we agree with Appellant that the combined teachings of Kaneko and Kaneko II would have suggested in the context of the process claims to put the lower inductive coil 31 around the solidified portion of the silicon ingot to control thermal gradients. Kaneko Appeal 2019-006538 Application 13/510,386 9 modified to use Kaneko II’s dual inductive coil system would have suggested operating the lower coil to achieve the benefits taught by Kaneko II (i.e., “a desired axial temperature gradient is given to the silicon immediately after solidified to prevent a thermal strain due to sudden cooling form being produced.”) (Kaneko II, col. 9, ll. 50–53). Stated differently, the teachings of the references as a whole would have suggested controlling the inductive frequency of the coils so that the solidified portion of the silicon ingot is temperature controlled according to Kaneko II’s teachings. The Examiner’s result-effective variable analysis is based on optimizing the inductive frequencies to “produce the temperature gradients necessary to produce a cast silicon ingot having the desired properties.” (Ans. 6–7). The Examiner has not established based on the teachings in Kaneko and Kaneko II that the optimization would have resulted in using a frequency of greater than 25 kHz in the lower coil so as to suppress mixing in the silicon melt as recited in the process claim 12. We find that the Examiner engaged in impermissible hindsight in rejecting claim 12, which is directed to a process rather than to an apparatus. According to Kaneko II’s teaching the silicon is already solidified when surrounded by the second coil. On this record, we reverse the Examiner’s § 103 rejections of claim 12 and claims 14 to 17 that depend on claim 12 that are rejected under rejections (2), (3), and (5). Rejection (2): Claim 4 Appellant’s arguments focus on the subject matter of claim 4 only (Appeal Br. 18–22). Arguments regarding claims 8 and 10 rely on arguments Appeal 2019-006538 Application 13/510,386 10 made regarding claim 1 (Appeal Br. 22). The rejection of claims 8 and 10 will stand or fall with claim 1. Appellant argues that Mosch and Kaneko II are significantly different such that one of ordinary skill in the art would not looked to Mosch’s radiant heat conduction shield for the magnetic shield of claim 4 (Appeal Br. 21). Appellant contends that the magnetic shields function to shield magnetic action between the plurality of induction coils, which is not technically related to the shielding of radiated heat from resistive heating elements as in Mosch (Appeal Br. 21). The Examiner responds that Mosch and Kaneko II are each related to systems and methods for using a crucible to form a cast structure from the melt and hence are analogous art (Ans. 7). We agree and note that Appellant does not respond to this finding in a Reply Brief. The Examiner further finds and Appellant does not contest that Mosch’s radiant shields are typically made of metal which is a good reflector of incident radiation and thus would also function as a magnetic shield (Ans. 7). Appellant has not shown reversible error with the Examiner’s analysis based on Mosch. Regarding Kim, Appellant argues that Kim does not teach a magnetic shield between a plurality of induction coils (Appeal Br. 21). Appellant contends that Kim’s magnetic shield only surrounds a single coil (Appeal Br. 21). The Examiner finds that “providing a magnetic shield which completely surrounds just one of the upper (7) or lower (31) induction coils in the teachings of Kaneko II would necessarily mean that a magnetic shield is installed between the two coils as required by claim 4.” (Ans. 8). We agree. As shown in Kim’s figure 1 the shield 3 forms a barrier below and Appeal 2019-006538 Application 13/510,386 11 above the coil 2. Applying that teaching Kaneko II would have resulted in a barrier between coils 7 and 31 as the Examiner finds. Appellant does not contest this finding in a Reply Brief. On this record, we affirm the Examiner’s § 103 rejection of claims 4, 8, and 10. Rejection (3): Claim 7 Appellant argues that Aratani teaches a plasma purification of silicon, not heating of the molten silicon material with a plasma torch (Appeal Br. 23). The Examiner finds that Aratani’s use of plasma torch to remove impurities would necessarily cause the raw material to be heated even it is performed primarily for a different purpose (Ans. 8). We agree. Appellant has not shown that Aratani’s use of the plasma torch to remove impurities from the silicon would not have resulted in heating the silicon melt too. On this record, we affirm the Examiner’s § 103 rejection of claim 7 over Kaneko, Kaneko II and Aratani. Rejection (4): Claims 9 and 11 Appellant relies on arguments made regarding claims 1, 4, and 7 (Appeal Br. 24–25). We find those arguments unpersuasive for the reasons noted supra in this decision. We affirm the Examiner’s § 103 rejection of claims 9 and 11. CONCLUSION In summary: Appeal 2019-006538 Application 13/510,386 12 Claims Rejected Basis Reference(s) Affirmed Reversed 1, 5, 6, 12 § 103 Kaneko, Kaneko II 1, 5, 6 12 4, 8, 10, 14 § 103 Kaneko, Kaneko II, Mosch, Kim 4, 8, 10 14 7, 17 § 103 Kaneko, Kaneko II, Aratani 7 17 9, 11 § 103 Kaneko, Kaneko II, Mosch, Aratani 9, 11 15, 16 § 103 Kaneko, Kaneko II, Sasatani 15, 16 Overall Outcome 1, 4–11 12, 14–17 TIME PERIOD FOR RESPONSE No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a). See 37 C.F.R. § 1.136(a)(1)(iv). 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