FLOSFIA INC.Download PDFPatent Trials and Appeals BoardSep 1, 20212020005498 (P.T.A.B. Sep. 1, 2021) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 16/231,042 12/21/2018 Masaya Oda FLOF167996 3634 26389 7590 09/01/2021 CHRISTENSEN O'CONNOR JOHNSON KINDNESS PLLC 1201 Third Avenue Suite 3600 Seattle, WA 98101 EXAMINER MILLER, MICHAEL G ART UNIT PAPER NUMBER 1712 NOTIFICATION DATE DELIVERY MODE 09/01/2021 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): efiling@cojk.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte MASAYA ODA and TOSHIMI HITORA Appeal 2020-005498 Application 16/231,042 Technology Center 1700 Before ADRIENE LEPIANE HANLON, KAREN M. HASTINGS, and JEFFREY B. ROBERTSON, Administrative Patent Judges. ROBERTSON, Administrative Patent Judge. DECISION ON APPEAL1 STATEMENT OF THE CASE Pursuant to 35 U.S.C. § 134(a), Appellant appeals from the Examiner’s decision to reject claims 1–11 and 14–20.2 See Appeal Br. 3. We have jurisdiction under 35 U.S.C. § 6(b). We AFFIRM. 1 This Decision includes citations to the following documents: Specification filed December 21, 2018 (“Spec.”); Final Office Action mailed October 4, 2019 (“Final Act.”); Appeal Brief filed December 29, 2019 (“Appeal Br.”); Supplemental Appeal Brief filed February 13, 2020 (“Supplemental Appeal Br.”); Examiner’s Answer mailed May 21, 2020 (“Ans.”), and Reply Brief filed July 21, 2020 (“Reply Br.”). 2 We use the term “Appellant” to refer to “applicant” as defined in 37 C.F.R. § 1.42. Appellant identifies Flosfia Inc. as the real party in interest. Appeal Br. 1. Appeal 2020-005498 Application 16/231,042 2 CLAIMED SUBJECT MATTER Appellant states the invention relates to a method for manufacturing an oxide crystal thin film. Spec. ¶ 2. Claim 1, reproduced below, is illustrative of the claimed subject matter (Appeal Br., Claims Appendix 19): 1. A method of manufacturing an oxide crystal film comprising: preparing a raw material solution comprising water and at least one compound that is selected from among gallium bromide, gallium iodide, indium bromide and indium iodide; forming raw material particles from the raw material solution comprising water and the at least one compound; carrying the raw material particles to a surface of a sample by a carrier gas; and forming an oxide crystal film comprising a corundum structure on the surface of the sample that comprises a corundum structure. Claim 14 is also independent and similarly recites a method of manufacturing an oxide crystal film. Id. at 21. Appeal 2020-005498 Application 16/231,042 3 REFERENCES The prior art relied upon by the Examiner is: Name Reference Date Freese et al. (“Freese”) US 4,569,881 Feb. 11, 1986 Bornstein US 4,876,117 Oct. 24, 1989 Banerjee et al. (“Banerjee”) US 5,180,686 Jan. 19, 1993 Falcony-Guajardo et al. (“’368 Patent”) US 5,882,368 Mar. 16, 1999 Myoshi US 7,147,805 B2 Dec. 12, 2006 Ishida et al. (“Ishida”) US 2005/0051793 A1 Mar. 10, 2005 Ulmer et al. (“Ulmer”) US 2006/0163563 A1 July 27, 2006 Lin et al. (“Lin”) US 2008/0254231 A1 Oct. 16, 2008 Foster et al. (“Foster”) Analogies in the Gallia and Alumina Systems. The Preparation and Properties of Some Low-Alkali Gallates, Journal of the American Chemical Society, Volume 73, pp 1500-1505 April 1951 Kim et al. (“Kim”) Optical properties of beta-Ga2O3 and alpha-Ga2O3:Co thin films grown by spray pyrolysis, J. Appl. Phys. 62(5), pp 2000-2002 September 1987 Karazhanov et al. (“Karazhanov”) Phase stability, electronic structure, and optical structure of indium oxide polytypes, Physical Review B 76, 075129 2007 UBC http://www.eos.ubc.ca/courses/Dist- Ed/eosc118-webpromo/01-modB- les17-webpromo.html Accessed Aug. 6, 2015 Appeal 2020-005498 Application 16/231,042 4 REJECTIONS 1. Claims 1, 3–6, 8, 9, and 20 are rejected under 35 U.S.C. § 103 as being unpatentable over Kim, Banerjee, Lin, Ishida, Foster, and UBC. Final Act. 3–8. 2. Claims 1, 2, 4–7, 9, 14, 15, 18, and 19 are rejected under 35 U.S.C. § 103 as being unpatentable over Bornstein, Miyoshi, the ’368 Patent, Karazhanov, Freese, and UBC. Final Act. 8–13. 3. Claims 10, 11, 16, and 17 are rejected under 35 U.S.C. § 103 as being unpatentable over Bornstein, Miyoshi, the ’368 Patent, Karazhanov, Freese, UBC, and Ulmer. Final Act. 14–15. OPINION Rejection 1 Appellant presents separate arguments with respect to claims 1, 3, 8, and 20 subject to this rejection. See Appeal Br. 9. We select claims 1 and 3 as representative for disposition of this rejection. 37 C.F.R. § 41.37(c)(1)(iv)(2019). Claim 1 The Examiner’s Rejection In rejecting claim 1 as unpatentable over Kim, Banerjee, Lin, Ishida, Foster, and UBC, the Examiner found Kim discloses a method for manufacturing an oxide crystal film, including crystalline alpha-gallia thin films from a raw material solution including water and gallium chloride. Final Act. 4. The Examiner found Kim does not disclose gallium iodide, Appeal 2020-005498 Application 16/231,042 5 gallium bromide, or the indium compounds, carrying the particles by a carrier gas, or the particular crystal structure for the substrate recited in claim 1. Id. at 5. The Examiner found Banerjee discloses depositing an oxide material by a spray pyrolysis method to uniformly deliver a mixture across at least one dimension of a substrate. Id. The Examiner found Lin discloses both gallium chloride/water and gallium bromide/water are known alternatives for forming gallium oxide. Id. at 5–6. As a result, the Examiner determined it would have been obvious to have used gallium bromide in water as a precursor material to form the gallium oxide film in Kim. Id. at 6. The Examiner found Ishida discloses a method of forming a gallium oxide gate insulating film layer on a semiconductor substrate comprising sapphire. Final Act. 6. The Examiner determined it would have been obvious to have formed the gallium oxide film on a sapphire substrate as disclosed in Ishida because Lin discloses gallium oxide as protective layers and Ishida discloses gallium oxide as insulating layers in systems comprising sapphire substrates. Id. at 6–7. The Examiner found that UBC provides evidence that sapphire is blue corundum and necessarily has a corundum structure. Id. at 7. Appellant’s Arguments Appellant argues the claimed method including at least one compound selected from gallium bromide, gallium iodide, indium bromide, and indium iodide achieves significantly reduced carbon impurity concentration and increased film forming speed, which not only demonstrate unpredictable effects, but also rebuts the Examiner’s position that it would have been obvious to use gallium bromide or gallium iodide instead of gallium chloride Appeal 2020-005498 Application 16/231,042 6 due to the similarity of the chemical structures. Appeal Br. 4–8. Appellant contends also the combination of Lin, Ishida, and UBC do not render the claims obvious because Lin is silent about the phase transition of gallium oxides such that Lin shows there is no reasonable expectation of similar properties in structurally similar compounds. Appeal Br. 8–9. Discussion We are not persuaded by Appellant’s arguments that the recited gallium bromide and gallium iodide achieve unpredictable effects with respect to a significantly reduced carbon impurity concentration and an increased film forming speed relative to gallium chloride. Initially, we observe that the reduced carbon impurity concentration appears to be due to the use of metal halides as precursors relative to carbon containing precursors. See Spec. ¶ 22 (“Note that in order to reduce the carbon impurity concentration, a metal compound included in the raw material solution is preferably free of carbon atoms.”). Thus, gallium bromide or gallium iodide do not appear to offer an advantage in this regard over gallium chloride. Compare “impurities” column of Table 1, Examples 9 and 10 (gallium chloride) with Examples 11–13 (gallium bromide and gallium iodide). Spec. ¶ 44. Regarding the film forming speed, the Examiner points out that the claims encompass any raw material solution comprising water and at least one of the claimed compounds under any transportation and formation process, whereas the Appellant has provided a single data point for most of the claimed precursors and two data points for gallium iodide. Ans. 4. Although Appellant contends that the results do not rely on any particular Appeal 2020-005498 Application 16/231,042 7 concentration or flow rate of carrier gas (Appeal Br. 6), the Specification indicates that such variables may alter the film forming properties. Spec. ¶ 40 (“The reason why a film was successfully formed, albeit at low speed, in Examples 9 and 10 although film formation failed in Non-Patent Document 1 is assumed to be related to the different flow rate of the carrier gas or the different concentration of the raw material solution.”). Thus, we do not find it reasonable for Appellant to rely on experimental results without addressing the particular conditions used to generate such results. In this regard, for the gallium iodide examples, the carrier gas flow rate is greater than used for gallium chloride. Spec. ¶ 44, Table 1, Examples 12 and 13 (gallium iodide, carrier gas flow rate 5 L/min), Examples 9 and 10 (gallium chloride, carrier gas flow rate 3 L/min). As such, given the recognized influence of carrier gas flow rate on film formation discussed above, we are of the view that there is insufficient evidence to attribute the increased film forming speed of gallium iodide relative to gallium chloride to the identity of the gallium species alone. In addition, the gallium iodide examples provide evidence that concentration alone influences film forming speed, as the raw material in Example 13 contains gallium iodide at increased concentration relative to Example 12, and produced a greater film forming speed. Id., Example 12 (concentration 0.05 mol/L, film forming speed 16.0 nm/min) and Example 13 (concentration 0.2 mol/L, film forming speed 55.0 nm/min). Although we recognize that a smaller increase in concentration in gallium chloride did not produce an increase in film forming speed for gallium chloride (Example 9 (concentration 0.1 mol/L, film forming speed 5.0 nm/min) and Example 10 (concentration 0.15 mol/L, film forming speed Appeal 2020-005498 Application 16/231,042 8 1.5 nm/min)), the acknowledged effect of carrier gas flow rate and concentration on film formation discussed above combined with the small number of data points does not sufficiently support Appellant’s position that the data is sufficient to demonstrate unexpected results. That is, because of the small sample data presented, we are unable to ascertain whether the difference in film forming speed observed in the examples would be consistently observed over the entirety of the scope of the claims, or that by simply optimizing the conditions, such as concentration or carrier gas flow rate, one of ordinary skill in the art would have been able to obtain similar results with gallium chloride as seen for gallium bromide or gallium iodide. Although we agree with the general principle set forth by Appellant that no set number of examples is required in order to demonstrate unexpected results (Reply Br. 2), the scope of the “objective evidence of nonobviousness must be commensurate in scope with the claims which the evidence is offered to support.” In re Tiffin, 448 F.2d 791, 792 (CCPA 1971); see also In re Peterson, 315 F.3d 1325, 1329-31 (Fed. Cir. 2003). In this case, while the results in Table 1 appear to show a level of improvement in film forming speed of gallium bromide and gallium iodide as compared to gallium chloride under certain conditions, the results are insufficient to indicate that such improvements would be obtained to a sufficient extent over the entire scope of the claims including various conditions and compositions included therein. For similar reasons, we are not persuaded by Appellant’s argument that the data is sufficient to rebut the Examiner’s rationale that it would have been obvious to have used gallium bromide instead of gallium chloride because of the close structural similarity and similar utility of both to form Appeal 2020-005498 Application 16/231,042 9 gallium oxide. Appeal Br. 6–8; Final Act. 6; Ans. 5. As discussed above, the data relied on by Appellant is insufficient to demonstrate that gallium bromide is not predictably interchangeable with gallium chloride in view of Lin’s disclosure that both may be used to form gallium oxide. Lin, Fig. 2B. That is, that one of ordinary skill in the art may have to optimize the conditions used to generate gallium oxide films based on different precursors does not mean that the use of different precursors is unpredictable, particularly in light of the known effects of concentration and carrier gas flow rate on film deposition discussed above. We are further not persuaded by Appellant’s argument that the teachings of Lin, Ishida, and UBC do not render the claims obvious. Appeal Br. 8–9. As the Examiner explains (Ans. 5–7), in pointing out certain deficiencies of each of these references, Appellant fails to account for the Examiner’s rejection as a whole, which details how the alleged deficiencies in each individual reference are met. The ultimate determination of whether a claimed invention would have been obvious or non-obvious is a legal conclusion, which is made based on considering and weighing all of the facts in evidence. See In re Oetiker, 977 F.2d 1443, 1445 (Fed. Cir. 1992). Furthermore, where the evidence of prima facie obviousness is particularly strong, evidence regarding unexpected results may be insufficient to overcome the evidence of prima facie obviousness. See Pfizer, Inc. v. Apotex, Inc., 480 F.3d 1348, 1372 (Fed. Cir. 2007). In this case, as explained above, Appellant’s arguments and evidence are insufficient to outweigh the Examiner’s position that claim 1 would have been obvious over the prior art of record. Appeal 2020-005498 Application 16/231,042 10 Accordingly, we affirm the Examiner’s rejection of claims 1, 4–6, and 9. Claims 3, 8, 20 Claim 3, as a representative claim, depends from claim 1 and recites “the oxide crystal film comprising the corundum structure comprises an α- phase Ga2O3 crystal.” Appellant contends that it is known that ß-Ga2O3 is the most stable phase of gallium oxide, and that Kim discloses ß-Ga2O3 and α-Ga2O3 are grown at the same temperature, such that Kim taches a totally different method than the claimed method. Appeal Br. 9–10. The Examiner explains that Kim provides a clear method for forming α-Ga2O3 film. Ans. 7. We agree with the Examiner. Kim discloses preparing an α-Ga2O3 film, where gallium chloride is doped with cobalt chloride. Kim 2000, col. 1, “II. EXPERIMENTAL PROCEDURE.” That Kim also discloses preparation of ß-Ga2O3 film does not take away from this teaching. Appellant does not sufficiently explain why Kim’s method as modified and detailed in the Examiner’s rejection (Final Act. 4–7) would not produce an α-Ga2O3 film simply because Kim discloses ß-Ga2O3 and α-Ga2O3 are grown at the same temperature. Thus, Appellant’s arguments are not persuasive. Accordingly, we affirm the Examiner’s rejection of claims 3, 8, and 20. Appeal 2020-005498 Application 16/231,042 11 Rejection 2 Appellant presents separate arguments with respect to claims 1, 2, 7, and 15 subject to this rejection. See Appeal Br. 17–18. We select claims 1 and 2 as representative for disposition of this rejection. 37 C.F.R. § 41.37(c)(1)(iv)(2019). Claim 1 The Examiner’s Rejection In rejecting claim 1 as unpatentable over Bornstein, Miyoshi, the ’368 Patent, Karazhanov, Freese, and UBC, the Examiner found Bornstein discloses a method for manufacturing an oxide crystal film by spraying a raw material including an organic solvent and a metal-containing compound on a substrate. Final Act. 8. The Examiner found Bornstein discloses metal precursor solutions including metals such as indium and metal halides, but does not expressly disclose indium bromide or indium iodide or water as a solvent. Id. at 8–9. The Examiner found Miyoshi discloses a composition for forming indium tin oxide (ITO) films, which includes mixing a water- soluble indium compound such as indium bromide or indium iodide. Id. at 9. The Examiner determined it would have been obvious to have modified Bornstein to include aqueous solutions of indium bromide and/or indium iodide as suggested by Miyoshi, because Bornstein separately considers indium sources and metal halides as desirable materials for the formation of metal oxide films on a substrate. Id. The Examiner relied on Karazhanov for disclosing that indium oxide is crystalline, and that the corundum structure of indium oxide produces superior stability and conductivity relative to other crystalline structures of indium oxide. Final Act. 10–11. As a result, the Examiner determined it Appeal 2020-005498 Application 16/231,042 12 would have been obvious to have formed the crystalline structure of indium oxide as the corundum structure for use in magnetic recording media as disclosed in Bornstein and Miyoshi. Id. at 11. The Examiner found that Freese discloses sapphire substrates, which as evidenced by UBC is blue corundum, are known acceptable substrates for magnetic recording disk, such that it would have been obvious to use such a substrate for use in combination with Bornstein and Miyoshi. Id. at 11–12. Appellant’s Arguments Appellant argues Bornstein only discloses transition metal halide precursors and does not disclose any metal halide includes indium. Appeal Br. 11. Appellant argues that any presumption that Bornstein discloses chlorides, bromides, and iodides are similar in function has been overcome by the comparative data in Appellant’s Specification, which discloses that indium bromide and indium iodide unpredictably leads to faster film forming speeds as compared to indium chloride. Id. at 12. In this regard, Appellant argues Miyoshi discloses indium chloride, indium bromide, and indium iodide to be equivalent and Appellant has demonstrated that this is not the case. Id. at 12–13. Appellant contends there is no reason to combine Miyoshi with Bornstein, because the metal oxide precursor in Bornstein is cured at lower temperatures than the indium compounds disclosed in Miyoshi, such that the compounds in Miyoshi would be incompatible with the process disclosed in Bornstein. Id. at 13–14. Appellant argues that it would not have been obvious to have modified Bornstein to use water instead of organic solvents, because Bornstein discloses “suitable” metal halides are those that are dissolved in certain organic solvents, such that Appeal 2020-005498 Application 16/231,042 13 Miyoshi’s disclosure of water-soluble indium halides would not be a “suitable” metal halide in the context of Bornstein. Id. at 15–17. Discussion Initially, we are not persuaded by Appellant’s argument that Bornstein only discloses transition metal halides. As the Examiner found (Ans. 8), Bornstein is not limited to transition metal halides, but discloses liquid metal precursors including metal halides where the metal is indium. Bornstein, col. 6, ll. 12–29, claims 1 and 2. In addition, we are not persuaded by Appellant’s argument that Bornstein does not disclose all of the limitations of the method recited in claim 1 (Appeal Br. 11), because, as the Examiner explains, Appellant does not address the Examiner’s combination, which relies on a combination of references in order to conclude the method of claim 1 would have been obvious. Ans. 8–9. We are also not persuaded by Appellant’s argument that the experimental data in the Specification is sufficient to demonstrate indium bromide or indium iodide are not interchangeable with indium chloride. Appeal Br. 12–13. As to any reduced carbon impurity concentration, we are not persuaded by this argument for similar reasons as discussed above with respect to Rejection 1. Compare “impurities” column of Table 1, Example 15 (indium chloride) with Examples 16 and 17 (indium bromide and indium iodide). Spec. ¶ 44. As to the results shown for indium bromide and indium iodide relative to indium chloride, we acknowledge that at the particular conditions for the single example of each compound tested (raw material concentration and carrier gas flow rate), there does appear to be a measurable improvement in Appeal 2020-005498 Application 16/231,042 14 film forming speed. Spec. ¶ 44, Table 1, Experiments 15–17. However, the claims are not limited to such conditions, and as discussed above, the sample size of data, in our view, is insufficient to support the breadth of the claims, even acknowledging that claim 14 is limited to indium bromide and indium iodide. Thus, while the results in Table 1 appear to show a level of improvement in film forming speed of indium bromide and indium iodide as compared to indium chloride under certain conditions, the results are insufficient to indicate that such improvements would be obtained to a sufficient extent over the entire scope of the claims including various conditions and compositions included therein. For similar reasons, we are not persuaded by Appellant’s argument that the data is sufficient to rebut the Examiner’s rationale that it would have been obvious to have used indium bromide or indium iodide because Miyoshi considers indium chloride, indium bromide, and indium iodide to be equivalent. Appeal Br. 12–13; Final Act. 9; Ans. 9. Further, we are not persuaded by Appellant’s argument that Bornstein and Miyoshi cannot be combined due to the alleged differences between the curing temperatures disclosed in Bornstein and the firing temperatures disclosed in Miyoshi. Appeal Br. 13–14. As the Examiner explains, Bornstein and Miyoshi disclose temperatures that overlap, such that Appellant’s reliance on preferred embodiments of each individual reference is not persuasive. Ans. 9. We are of the view the Examiner’s position is supported by the record. That is, Bornstein discloses “the liquid precursor is cured at a moderate elevated temperature, typically in the range from about 100° to 300° C.” Bornstein, col. 2, ll. 23–25. Miyoshi discloses “[f]iring Appeal 2020-005498 Application 16/231,042 15 can be carried out, for example, at about 300 to about 700° C.” Miyoshi, col. 17, ll. 13–14. Accordingly, Appellant’s argument is not persuasive. We are also not persuaded by Appellant’s argument that the use of water would be a change in the principle of operation of Bornstein, because Bornstein discloses that “suitable” metal halides are all soluble in organic solvents. Appeal Br. 14–17. Although Bornstein discloses suitable transition metal halides are soluble in organic solvents (col. 4, ll. 3–37), we do not view such disclosures as limiting to all the metal halide precursors disclosed in Bornstein. Rather, with respect to the choice of solvent Bornstein merely requires only that “sufficient solvent must be present to dissolve the metal oxide precursor” and that the metal oxide material is “cured at an elevated temperature for a time sufficient to evaporate the solvent.” Bornstein, col. 4, ll. 55–65. Thus, we are not persuaded that using water as a solvent as disclosed in Miyoshi (col. 3, ll. 38–43, col. 8, ll. 55–64) would be contrary to the principle of operation of Bornstein, where both references disclose forming indium oxide films. Ans. 10–11; Miyoshi, col. 6, ll. 4–8; Bornstein, col. 4, ll. 55–65. Accordingly, after weighing the evidence as a whole, we affirm the Examiner’s rejection of claims 1, 4–6, 9, 14, 18, and 19 for the reasons discussed above. Claims 2, 7, 15 Representative claim 2 depends from claim 1, and further recites “the oxide crystal film comprising the corundum structure comprises α-phase In2O3 crystal.” Appeal 2020-005498 Application 16/231,042 16 Appellant contends that it is known that the most stable phase of indium oxide is a bixbyte structure, and it is difficult to grow an α-phase In2O3 crystal therefrom with good reproducibility. Appeal Br. 17. We are not persuaded by Appellant’s arguments for the reasons given by the Examiner. Ans. 11. In particular, as the Examiner points out, Karazhanov provides evidence of an α-phase In2O3 crystal, which Appellant has not rebutted. Karazhanov 2. That there may be some difficulty associated with producing the structure recited in claim 2, does not mean that such a structure would not have been obvious. Accordingly, we affirm the Examiner’s rejection of claims 2, 7, and 15. Rejection 3 Regarding the rejection of claims 10, 11, 16, and 17, Appellant does not separately argue this rejection. See Appeal Br. 18. Accordingly, we affirm the Examiner’s rejection for similar reasons as discussed above with respect to Rejection 2. Appeal 2020-005498 Application 16/231,042 17 DECISION SUMMARY In summary: Claim(s) Rejected 35 U.S.C. § Reference(s)/Basis Affirmed Reversed 1, 3–6, 8, 9, 20 103 Kim, Banerjee, Lin, Ishida, Foster, UBC 1, 3–6, 8, 9, 20 1, 2, 4–7, 9, 14, 15, 18, 19 103 Bornstein, Miyoshi, the ’368 Patent, Karazhanov, Freese, UBC 1, 2, 4–7, 9, 14, 15, 18, 19 10, 11, 16, 17 103 Bornstein, Miyoshi, the ’368 Patent, Karazhanov, Freese, UBC, Ulmer 10, 11, 16, 17 Overall Outcome 1–11, 14–20 No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a). See 37 C.F.R. § 1.136(a)(1)(iv). AFFIRMED Copy with citationCopy as parenthetical citation