Ex Parte Zhang et alDownload PDFPatent Trial and Appeal BoardMay 3, 201612647201 (P.T.A.B. May. 3, 2016) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. FILING DATE FIRST NAMED INVENTOR 12/647,201 12/24/2009 21186 7590 05/05/2016 SCHWEGMAN LUNDBERG & WOESSNER, P.A. P.O. BOX 2938 MINNEAPOLIS, MN 55402 Renhua Zhang UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. 3245.015US 1 1513 EXAMINER STAGG, MIRIAM ART UNIT PAPER NUMBER 1724 NOTIFICATION DATE DELIVERY MODE 05/05/2016 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address( es): uspto@slwip.com SLW@blackhillsip.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte RENHUA ZHANG, BILL PHAN, JOHN GORMAN, ALAIN PAUL BLOSSE, and MARTIN KAES Appeal2014-008953 Application 12/647,201 Technology Center 1700 Before BRADLEY R. GARRIS, N. WHITNEY WILSON, and JENNIFER R. GUPTA, Administrative Patent Judges. GUPTA, Administrative Patent Judge. DECISION ON APPEAL Appellants appeal 1 under 35 U.S.C. § 134 from the Examiner's decision2 finally rejecting claims 1-13. We have jurisdiction under 35 U.S.C. § 6(b). We affirm. The claims are directed to a solar cell. Claim 1, reproduced below, is illustrative of the claims on appeal. 1. A solar cell comprising: 1 Appellants identify the real party in interest as Silicor Materials Inc. Appeal Brief filed February 27, 2014 ("App. Br."), 2. 2 Final Office Action mailed May 31, 2013 ("Final Act."). Appeal2014-008953 Application 12/647,201 a substrate comprised of silicon of a first conductivity type; a layer of silicon of a second conductivity type disposed on said substrate; a passivation layer disposed on said layer of silicon, wherein said passivation layer is silicon oxynitride; and an anti-reflection (AR) layer disposed on said passivation layer, wherein said AR layer is comprised of silicon carbon nitride (SiCN). App. Br. 10 (Claims Appendix). REJECTIONS On appeal, the Examiner maintains the following rejections: 1. Claims 1-8 and 12-13 under 35 U.S.C. § 103(a) as unpatentable over Park3 in view of Limmanee. 4 2. Claims 9-11under35 U.S.C. § 103(a) as unpatentable over Park in view of Limmanee, and further in view of A wad. 5 Examiner's Answer mailed May 13, 2014, 4--5. Appellants do not present separate arguments specifically directed to dependent claims 2-13, which depend directly from claim 1. Therefore, the dependent claims will stand or fall with independent claim 1. 3 Park et al., US 2007/0175508 Al, published August 2, 2007 (hereinafter "Park"). 4 Limmanee et al., Preparation of Hydrogenated Amorphous Silicon Carbon Nitride Films by Hot-Wire Chemical Vapor Deposition Using Hexamethyldisilazane for Silicon Solar Cell Applications, 46 Japanese Journal of Applied Physics 56-59 (2007) (hereinafter "Limmanee"). 5 Awad et al., WO 2008/104059 Al, published September 4, 2008 (hereinafter "A wad"). 2 Appeal2014-008953 Application 12/647,201 Appellants argue that "there is no teaching or suggestion in Limmanee or Park that suggests combining SiCxNy with a silicon passivation layer." App. Br. 7. Appellants' argument is not persuasive. Park teaches a solar cell that includes a substrate formed of a first conductivity type ( 11 ), a layer of silicon of a second conductivity type (12) formed on the substrate (11 ), a passivation layer of silicon oxynitride (14) formed on the second conductivity type layer (12), and an antireflective layer of silicon nitride (15) formed on the passivation layer (14). Park i-f 20; Fig. 1. Although Park is silent as to an antireflective layer of silicon carbon nitride, Limmanee teaches both silicon nitride (SiNx) films and silicon carbon nitride (SiCxNy) films are useful for the same purpose-as antireflective layers for solar cells. Limmanee 56 (Introduction). The Examiner determines that it would have been obvious for one of ordinary skill in the art at the time the invention was made to substitute the silicon nitride antireflective layer of Park with a silicon carbon nitride antireflective layer disclosed in Limmanee because the obviousness of interchanging art recognized alternatives is well established. Final Act. 3--4. Appellants have not shown reversible error in this determination. See In re Fout, 675 F.2d 297, 301(CCPA1982) (Where two known alternatives are interchangeable for a desired function, an express suggestion to substitute one for the other is not needed to render a substitution obvious.). Relying on page 3, lines 15-18 of the Specification, Appellants argue that "the specific combination of a silicon oxynitride passivation layer and a silicon carbon nitride AR layer as claimed provides unexpected benefits." App. Br. 7. This argument is not persuasive because the disclosure in the Specification does not identify the results as unexpected. "[A ]ny superior 3 Appeal2014-008953 Application 12/647,201 property must be unexpected to be considered as evidence of non- obviousness." Pfizer, Inc. v. Apotex, Inc., 480 F.3d 1348, 1371 (Fed. Cir. 2007); see also In re Greenfield, 571F.2d1185, 1189 (CCPA 1978) (arguments of counsel cannot take the place of evidence). Moreover, as the Examiner correctly finds, the alleged evidence of unexpected results is also deficient because: (1) it is not commensurate in scope with the appealed claims with respect to a number of parameters, and (2) it does not include a comparison of the claimed invention with the closest prior art (i.e., Park) (Ans. 7). DECISION For the above reasons, we affirm the rejections of claims 1-13. No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a). AFFIRMED 4 Copy with citationCopy as parenthetical citation