Ex Parte Okimoto et alDownload PDFPatent Trial and Appeal BoardSep 22, 201613060376 (P.T.A.B. Sep. 22, 2016) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. FILING DATE FIRST NAMED INVENTOR 13/060,376 02/23/2011 Tadao Okimoto 22850 7590 09/26/2016 OBLON, MCCLELLAND, MAIER & NEUSTADT, LLP, 1940 DUKE STREET ALEXANDRIA, VA 22314 UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. 375642US26PCT 8327 EXAMINER WANGA, TIMON ART UNIT PAPER NUMBER 1756 NOTIFICATION DATE DELIVERY MODE 09/26/2016 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address( es): patentdocket@oblon.com oblonpat@oblon.com ahudgens@oblon.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte TADAO OKIMOTO and HIROSHI TAMAGAKI Appeal2014-008948 Application 13/060,376 Technology Center 1700 Before PETER F. KRATZ, BEVERLY A. FRANKLIN, and JENNIFER R. GUPTA, Administrative Patent Judges. KRATZ, Administrative Patent Judge. DECISION ON APPEAL This is a decision on an appeal under 35 U.S.C. § 134 from the Examiner's final rejection of claims 1---6. We have jurisdiction pursuant to 35 U.S.C. § 6. An oral hearing was conducted on September 15, 2016. Appellants' claimed invention is directed to a sputter device that includes plural sputter evaporation sources and a power supply device that includes a power source connected to the plural sputter evaporation sources in a manner so as to supply continuous power to each of the sputter evaporation sources (Spec. i-f 18). In addition to the aforementioned power source, the power supply device of Appellants' claimed sputter device further includes a DC voltage generating unit and a pulse distribution and supply system connected to the Appeal2014-008948 Application 13/060,376 cathode side of the DC voltage generation unit and each of the sputter evaporation sources via switching elements of the pulse distribution and supply system (Spec. i-fi-f 18, 25, 26, Fig. 1 ). Furthermore, a controller is configured and connected so as to control respective switching elements to selectively assume an ON state so as to distribute and supply pulsed power from the DC voltage generating unit to each of the sputter evaporation sources sequentially in a time division pulsed state (Spec. ,-r 27). Claim 1, the sole independent claim on appeal, is illustrative and reproduced below: Claim 1. A sputter device, comprising: a plurality of sputter evaporation sources; and a power supply device for supplying power to a plurality of said sputter evaporation sources, wherein said power supply device comprises a power source provided to each of a plurality of said sputter evaporation sources and connected to said plurality of sputter evaporation sources so as to supply continuous power to each of said sputter evaporation sources, a DC voltage generating unit common to said plurality of sputter evaporation sources, and a pulse distribution and supply system connected to the cathode side of said DC voltage generating unit, wherein the pulse distribution and supply system includes a switching element connected between said cathode side of said DC voltage generating unit and each of said sputter evaporation sources, said switching elements each being positionable in ON and OFF states to selectively connect the cathode side of said DC voltage generating unit and a respective one of said sputter evaporation sources, and a controller connected and configured to control the respective switching elements to selectively assume the ON state, to thereby distribute and supply pulsed power from said DC voltage generating unit to each of said sputter evaporation sources sequentially in a time division pulse state. 2 Appeal2014-008948 Application 13/060,376 The Examiner relies on the following prior art references as evidence in rejecting the appealed claims: Tuymer et al. Kouznetsov US 2005/0098430 Al US 2006/0278518 Al May 12, 2005 ("Tuymer") Dec. 14, 2006 The Examiner maintains the following grounds of rejection: Claims 1---6 stand rejected under 35 U.S.C. § 103(a) as being unpatentable over Kouznetsov in view of Tuymer. We reverse the stated rejection substantially for the reasons argued by Appellants (App. Br. 4--8; Reply Br. 1-3). It is well settled that the burden of establishing a prima facie case of non-patentability resides with the Examiner. See In re Piasecki, 745 F.2d 1468, 1472 (Fed. Cir. 1984). Here, the Examiner's reliance on a combination of Kouznetsov and Tuymer to underpin the stated obviousness rejection is not well-founded. The Examiner has basically determined that Kouznetsov teaches a sputter device substantially corresponding to claim 1 but does not teach "the presence of a plurality of sputter evaporation sources" or "a DC pulse distribution system," as recited in the claim. (Ans. 2). In particular and contrary to the Examiner's findings, the Examiner has not established that Kouznetsov teaches or suggests a power source connected to a sputter evaporation source in a manner to supply continuous power to the sputter evaporation source in combination with a DC voltage generation unit and a pulse distribution and supply system connected to the cathode side of the DC voltage generation unit and the sputter evaporation source via a switching element of a pulse distribution and supply system. 3 Appeal2014-008948 Application 13/060,376 Nor has the Examiner established that Kouznetsov teaches or suggests a power source connected to plural sputter evaporation sources in a manner so as to supply continuous power to each of the sputter evaporation sources and further includes a DC voltage generating unit and a pulse distribution and supply system connected to the cathode side of the DC voltage generation unit and each of the sputter evaporation sources via switching elements of the pulse distribution and supply system, as more fully set forth in Appellants' claim 1. For instance, the Examiner appears to conflate Kouznetsov' s disclosures with respect to an energy source for supplying biasing pulses as set forth in paragraph 59 and the disclosures with respect to a pulse generator connected for work piece biasing as set forth in paragraph 114 with the provision of a power source connected to a sputter evaporation source in a manner so as to supply continuous power to the sputter evaporation source (Ans. 3, 6-8). However, the cited disclosures of Kouznetsov do not support the Examiner's findings as urged by Appellants (App. Br. 4--6; Reply Br. 1-2). Moreover and as argued by Appellants, the Examiner has not established that Tuymer makes up for the deficiencies in the teachings of Kouznetsov by teaching or suggesting a sputter device having a power supply device including a power source connected to plural sputter evaporation sources in a manner so as to supply continuous power to each of the sputter evaporation sources and a DC voltage generating unit as well as a pulse distribution and supply system connected to the cathode side of the DC voltage generation unit and each of the sputter evaporation sources via switching elements of the pulse distribution and supply system, and 4 Appeal2014-008948 Application 13/060,376 including a controller and configured so as to distribute and supply pulsed power from the DC voltage generating unit to each of the sputter evaporation sources sequentially in a time division pulsed state, as more fully set forth in Appellants' claim 1 (App. Br. 6-8; Reply Br. 3). After all, rejections based on§ 103(a) must rest on a factual basis with these facts being properly set forth and interpreted without hindsight reconstruction of the invention from the prior art. See In re Warner, 379 F.2d 1011, 1017 (CCPA 1967). On this record, we reverse the Examiner's obviousness rejections of the appealed claims. CONCLUSION The Examiner's decision to reject the appealed claims is reversed. REVERSED 5 Copy with citationCopy as parenthetical citation