Ex Parte HatanoDownload PDFBoard of Patent Appeals and InterferencesMay 17, 201010899030 (B.P.A.I. May. 17, 2010) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES ____________ Ex parte AKITSUGU HATANO ____________ Appeal 2009-006447 Application 10/899,030 Technology Center 1700 ____________ Decided: May 17, 2010 ____________ Before CATHERINE Q. TIMM, BEVERLY A. FRANKLIN, and LINDA M. GAUDETTE, Administrative Patent Judges. GAUDETTE, Administrative Patent Judge. DECISION ON APPEAL Appellant appeals under 35 U.S.C. § 134(a) from the Examiner’s decision finally rejecting claims 1, 2, 9-11, 14, and 30 (Final Office Action, mailed Jul. 12, 2007, 1). (Appeal Brief (“App. Br.”), filed Jun. 18, 2008, 5.) We have jurisdiction under 35 U.S.C. § 6(b). Appeal 2009-006447 Application 10/899,030 We AFFIRM. The Examiner maintains (Examiner’s Answer (“Ans.”), mailed Sep. 3, 2008, 3), and Appellant requests review of (App. Br. 10), the sole ground of rejection: claims 1, 2, 9-11, 14, and 30 under 35 U.S.C. § 103(a) as unpatentable over Sakai (US 2002/0007793 A1, pub. Jan. 24, 2002) in view of Sago (US 2003/0159779 A1, pub. Aug. 28, 2003). We separately consider the patentability of dependent claim 30 based on Appellant’s arguments directed to limitations in claim 30. (See App. Br. 15-16.) The remaining claims stand or fall with independent claim 1. Claims 1 and 30 are reproduced below from the Claims Appendix to the Appeal Brief: 1. A plasma processing system comprising: a processing chamber; a substrate holder provided within said processing chamber for holding a target substrate; a composite electrode provided within said processing chamber to oppose said substrate holder and having a plurality of discharge electrodes for generating plasma; material gas supply means for supplying a material gas into said processing chamber; plasma region increasing/reducing means for increasing or reducing a plasma region formed within said processing chamber; cleaning means for plasma cleaning an inside of said processing chamber by using plasma generated in said plasma region increased or reduced by said plasma region increasing/reducing means; wherein said substrate holder is constructed as an electrode; and 2 Appeal 2009-006447 Application 10/899,030 during plasma cleaning said plasma region increasing/reducing means causes an interior of the processing chamber to be at a relatively high pressure so that plasma is generated between said discharge electrodes and causes the interior of the processing chamber to be at a relatively low pressure so that plasma is generated between said composite electrode and said substrate holder. 30. The plasma processing system of claim 1, wherein during cleaning the plasma region increasing/reducing means causes an interior of the processing chamber to be at a relatively high pressure for a first period of time, and then reduces the pressure so as to cause the interior of the processing chamber to be at a relatively low pressure for a period of time. Appellant does not dispute the Examiner’s findings with respect to Sakai’s disclosure. (See generally, App. Br. 12-16.) Nor does Appellant present arguments directed toward the Examiner’s proposed motivation for combining Sakai and Sago. (Id.) We identify the following issue as dispositive of the Appeal: Did the Examiner err in finding that the structure corresponding to Appellant’s claimed “plasma region increasing/reducing means” reads on Sago’s structure for controlling pressure of a plasma process? We answer this question in the negative based on the facts and reasons relied on by the Examiner in the Final and the Answer. Thus, we adopt the Examiner’s findings and reasons (Final 2-7; Ans. 4-15) as our own, adding the following discussion for the sake of completeness. Claim 1 includes the following means-plus-function limitation: “plasma region increasing/reducing means for increasing or reducing a plasma region formed within said processing chamber.” The Examiner 3 Appeal 2009-006447 Application 10/899,030 found that the structure corresponding to this limitation is described on page 30, lines 4-9 of the Specification (cited in Ans. 8), which read as follows: The plasma region increasing/reducing means of this embodiment includes, as shown in FIG. 13, a pressure control mechanism 40 for controlling the pressure within the processing chamber 5 to which the reaction gas is supplied by the gas supply unit 13. The pressure control mechanism 40 includes a detection unit 41 for detecting the pressure within the processing chamber 5, and a control unit 42 for controlling the gas supply unit 13 and the vacuum pump 10. The Examiner also found that Sago describes structure “(control unit 8, pump 111, pump controller 112, gas supply unit 3)” (Ans. 4-5 (citing Sago ¶¶ [0016], [0033], [0037], and [0040])) which controls the pressure of the plasma process. The Examiner found, more specifically, that the pressure control mechanism of Sago et al. includes a control unit 8, 112 using a detection unit for detecting the pressure (i.e. confirming pressure indicates a detection unit is used), and the control unit 8 controls the gas supply unit 3 and the vacuum pump 111 in order to control the pressure for the selected plasma process. (Ans. 13.) The Examiner concluded that Sakai’s apparatus, as modified to include Sago’s structure (i.e., control unit 8, pump 111, pump controller 112, and gas supply unit 3) includes the structural limitations of Appellant’s claimed plasma region increasing/reducing means and, therefore, would be capable of performing Appellant’s claimed function of “increasing or reducing a plasma region formed within said processing chamber” (claim 1). (Ans. 4-5; see also, Ans. 8-12 (Response to Argument).) Appellant concedes that the structure described on page 30, lines 4-9 of the Specification corresponds to the recited “plasma region 4 Appeal 2009-006447 Application 10/899,030 increasing/reducing means.” (App. Br. sentence bridging 12-13; Reply Brief (“Rep. Br.”), filed Nov. 3, 2008, 5.) However, Appellant contends that the corresponding function for the recited means extends to the functional recitations in claim 1, last para., and in claim 30. (See, e.g., App. Br. 13 (first full para.), 14 (ll. 13-17) and 15 (as to claim 30); Rep. Br. 2 (last para.), 3 (first para.) and 4 (as to claim 30).) Thus, while Appellant concedes that Sago discloses “a basic type of pressure control mechanism . . . structured [] to maintain the pressure in the process chamber at a particular value” (Rep. Br. 6; see also, App. Br. 14 and 15, last paras.), Appellant argues that the applied prior art fails to teach or suggest “changing pressures of the chamber during cleaning” as required by claim 1, last para. and by claim 30. (Rep. Br. 3-4; see also, App. Br. paras. bridging 14-15 and 15-16). The Examiner maintains, and we agree, that the recitations in claim 1, last para., and in claim 30 are merely statements of intended use for the claimed “plasma region increasing/reducing means.” The Examiner found that the proposed combination of Sakai and Sago would be “capable of” performing the intended use recited in the last paragraph of claim 1. (Ans. 5; see also, Ans. 8-12.) The Examiner made similar findings with respect to the limitations recited in claim 30. (Ans. 7-8; see also, Ans. 12-15.) The Examiner’s findings are supported by the relied-upon disclosure in the references, in particular, Sago ¶¶ [0016], [0033], [0037], and [0040]. [W]here the Patent Office has reason to believe that a functional limitation asserted to be critical for establishing novelty in the claimed subject matter may, in fact, be an inherent characteristic of the prior art, it possesses the authority to require the applicant to prove that the subject matter shown to be in the prior art does not possess the characteristic relied on. 5 Appeal 2009-006447 Application 10/899,030 In re Schreiber, 128 F.3d 1473, 1478 (Fed. Cir. 1997) (quoting In re Swinehart, 439 F.2d 210, 213 (C.C.P.A. 1971)). See also, Intel Corp. v. U.S. Int'l Trade Comm'n, 946 F.2d 821, 832 (Fed. Cir. 1991) (noting that courts have interpreted functional language in an apparatus claim as requiring that the apparatus possess the capability of performing the recited function). Appellant has not attempted to refute the Examiner’s finding that an apparatus resulting from the Examiner’s proposed combination of Sakai and Sago would be capable of changing pressures as recited in claims 1 and 30. Therefore, Appellant has not persuaded us that the Examiner erred in concluding that the claimed invention would have been obvious within the meaning of 35 U.S.C. § 103(a). In view of the foregoing, we sustain the rejection of claims 1, 2, 9-11, 14, and 30 under 35 U.S.C. § 103(a) as unpatentable over Sakai in view of Sago. No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(1). AFFIRMED ssl NIXON & VANDERHYE, PC 901 NORTH GLEBE ROAD, 11TH FLOOR ARLINGTON, VA 22203 6 Copy with citationCopy as parenthetical citation