Ex Parte FrankDownload PDFPatent Trial and Appeal BoardJan 2, 201310283971 (P.T.A.B. Jan. 2, 2013) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE PATENT TRIAL AND APPEAL BOARD ____________ Ex parte MICHAEL L. FRANK ____________ Appeal 2010-008541 Application 10/283,971 Technology Center 2800 ____________ Before CARL W. WHITEHEAD, JR., ERIC S. FRAHM and ANDREW J. DILLON, Administrative Patent Judges. WHITEHEAD, JR., Administrative Patent Judge. DECISION ON APPEAL Appeal 2010-008541 Application 10/283,971 2 STATEMENT OF THE CASE Appellant is appealing claims 3 and 5. Appeal Brief 3. We have jurisdiction under 35 U.S.C. § 6(b) (2012). We reverse. Introduction The invention is directed resistors in gallium arsenide semiconductor devices. Appeal Brief 3-4. Illustrative Claims 3. A device comprising: a resistor including: a semi-insulating substrate; an active layer, positioned over the semi-insulating substrate, including an epitaxial layer designed for enhancement mode operation; a first channel region positioned over the active layer; a first gate metal covering a portion of the first channel region; ohmic contact material positioned at opposing ends of the active layer; a second gate metal covering a portion of the first channel region; and metal positioned over the opposing ends of the active layer to form input/output pads. 5. A device comprising: a resistor including: a semi-insulating substrate; an active layer, positioned over the semi-insulating substrate, including an epitaxial layer designed for enhancement mode operation; Appeal 2010-008541 Application 10/283,971 3 a first channel region having a serpentine shape, positioned over the active layer; a first gate metal covering a portion of the first channel region; ohmic contact material positioned at opposing ends of the active layer; a second gate metal covering a portion of the first channel region; and metal positioned over the opposing ends of the active layer to form input/output pads. Rejections on Appeal Claim 3 stands rejected under 35 U.S.C. §103(a) as being unpatentable over Sriram (U.S. Patent Number 6,906,350 B2; issued June 14, 2005, filed October 24, 2001), Schnabel (U.S. Patent Number 5,268,650; issued December 7, 1993) and Yamashita (U.S. Patent Application Publication Number: 2005/0017272 A1; published January 27, 2005, Foreign Application Priority Data , JP 2001-366767, Nov. 30, 2001). Answer 3-4. Claim 5 stands rejected under 35 U.S.C. §103(a) as being unpatentable over Sriram, Schnabel, Yamashita and Cheney (U.S. Patent Number 3,731,164; issued May 1, 1973). Answer 5. Issues on Appeal Do Sriram, Schnabel and Yamashita, either alone or in combination, disclose a semiconductor device having enhancement mode semiconductor device as claimed? Do Sriram, Schnabel, Yamashita and Cheney, either alone or in combination, disclose a semiconductor device having enhancement mode semiconductor device as claimed? Appeal 2010-008541 Application 10/283,971 4 ANALYSIS Appellant argues that Sriram is deficient because it does not disclose an “epitaxial layer designed for enhancement mode operation” as recited in claim 3. Appeal Brief 6. The Examiner acknowledges Sriram’s deficiency and relies upon the teachings of Yamashita to address it. Answer 4. Appellant argues that Yamashita does not address Sriram’s deficiency because there is no indication within Yamashita that the delta doped SiC layer 41 is either epitaxial or designed for enhancement mode operation. Appeal Brief 7. The Examiner finds that because Sriram discloses an epitaxial delta doped active layer 14, Yamashita was cited to show that a delta doped SiC layer can used in an enhancement mode transistor operation and together, Sriram and Yamashita discloses that an epitaxial delta doped SiC layer can be used in an enhancement mode transistor operation. Answer 6. The employment of epitaxial layers are well known in the art and it is evident by Appellant’s own Specification that growing the enhancement mode layer as opposed to forming it via a deposition method is not critical to the invention’s novelty. See Specification [0017]. However, we do not agree with the Examiner’s findings and we find Appellant’s argument that there is no motivation to combine the references because the combination of references would not disclose the claimed resistor to be persuasive. Appeal Brief 7. Sriram discloses a MESFET (metal semiconductor field effect transistor) which is a depletion mode transistor because of its ability to control the channel by varying the depletion layer under the metal contact. See Sriram’s Figure 1. Therefore Appeal 2010-008541 Application 10/283,971 5 there is no reason to modify Sriram’s active layer 14 in the manner in which the Examiner’s proposes by including an enhancement mode layer which is counter intuitive to Sriram’s basic operation. Schnabel does not address Sriram’s deficiency. Therefore we do not sustain the Examiner’s rejection of claim 3. We do not sustain the Examiner’s rejection of claim 5, having limitations commensurate in scope with claim 3, for the same reasons as stated above because Cheney does not address the noted deficiency of the combination of Sriram, Yamashita and Schnabel. DECISION The rejections of claims 3 and 5 are reversed. REVERSED Vsh Copy with citationCopy as parenthetical citation