Ex Parte Ervin et alDownload PDFPatent Trial and Appeal BoardMay 12, 201612822492 (P.T.A.B. May. 12, 2016) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. FILING DATE FIRST NAMED INVENTOR 12/822,492 06/24/2010 Joseph ER VIN 44152 7590 05/16/2016 ROBERTS MLOTKOWSKI SAFRAN & COLE, P.C. Intellectual Property Department P.O. Box 10064 MCLEAN, VA 22102-8064 UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. BUR920090078US 1 5943 EXAMINER MALEK, MALIHEH ART UNIT PAPER NUMBER 2813 NOTIFICATION DATE DELIVERY MODE 05/16/2016 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address( es): docketing@rmsclaw.com lgallaugher@rmsclaw.com dbeltran@rmsclaw.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte JOSEPH ERVIN, JEFFREY B. JOHNSON, KEVIN McSTA Y, PAUL C. PARRIES, CHEN GWEN PEI, GENG WANG, and Y ANLI ZHANG Appeal2014-006102 Application 12/822,492 Technology Center 2800 Before MAHSHID D. SAADAT, JAMES R. HUGHES, and JOYCE CRAIG, Administrative Patent Judges. CRAIG, Administrative Patent Judge. DECISION ON APPEAL Appellants 1 appeal under 35 U.S.C. § 134(a) from the Examiner's Final Rejection of claims 1-8, 13-16, and 18-20, which constitute all the claims pending in this application.2 We have jurisdiction under 35 U.S.C. § 6(b ). We affirm. 1 According to Appellants, the real party in interest is International Business Machines Corporation. App. Br. 2. 2 Claim 12 has been canceled. Final Act. 2. Claim 17 is allowed. Id. at 1. Claims 9-11, 21, and 22 are objected to as dependent upon a rejected base claim, but indicated as allowable if rewritten in independent form. Id. at 8. Appeal2014-006102 Application 12/822,492 INVENTION Appellants' invention relates to structure and methods for controlling bottom comer threshold in a semiconductor-on-insulator (SOI) device. Abstract. Claim 1 is illustrative and reads as follows: 1. A method of fabricating a semiconductor structure, compnsmg: doping a comer region of a semiconductor-on-insulator (SOI) island, wherein the doping comprises tailoring a localized doping of the comer region to reduce capacitive coupling of the SOI island with an adjacent structure. REJECTIONS Claims 1-5, 8, 13, 14, and 18-20 stand rejected under 35 U.S.C. § 102(b) as anticipated by Radens et al. (US 6,426,252 B 1; issued July 30, 2002). Claims 6, 7, 15, and 16 stand rejected under 35 U.S.C. § 103(a) as unpatentable over the combination of Radens and Bronner et al. (US 6,638,815 Bl; issued Oct. 28, 2003). ANALYSIS Claims 1, 3-5, 8, 13, and 14-35U.S.C.§102(b) Appellants contend the cited portions of Radens do not teach the claim limitation "wherein the doping comprises tailoring a localized doping of the comer region to reduce capacitive coupling of the SOI island with an adjacent structure," as recited in claim 1. App. Br. 4--5. Appellants argue that Radens makes no mention of reducing capacitive coupling of the SOI island 124 with an adjacent structure. Id. at 5. Appellants further argue that the Examiner has not demonstrated or explained how the cited structure of 2 Appeal2014-006102 Application 12/822,492 Radens meets the functional limitation "to reduce capacitive coupling of the SOI island with an adjacent structure," recited in claim 1. Id. at 6. Finally, Appellants argue that the Examiner has not adequately supported the determination that Radens inherently teaches tailoring a localized doping of the comer region which reduces capacitive coupling of the SOI island with an adjacent structure in selected areas. Id. at 7. The Examiner responded that claim 1 is not structurally distinguishable over Radens. Ans. 3--4 (citing Radens Figs. 2H-2I). The Examiner found that Radens, similar to Appellants' Specification, discloses "SOI island 124 on a BOX layer 122 with a comer 144-162." Final Act. 3. The Examiner further found in Radens an adjacent structure surrounding the SOI island, including structures OT 134, TTO 148, and GC 154. Id. The Examiner found that "[p ]art of the comer 144-162 is connected to the trench top oxide 148." Id. Therefore, the Examiner concluded that "Radens teaches a method of fabricating a semiconductor structure, comprising: doping a comer region of a semiconductor-on-insulator (SOI) island 124, wherein the doping comprises tailoring a localized doping of the comer region 162 .... " Final Act. 5 (citing Radens Figs. 2C-2I, col. 5, 1. 62---col. 6, 1. 10, col. 6 11. 51-55, and col. 3, 11. 1-11 ). We agree with the Examiner that claim 1 is not structurally distinguishable over Radens. In the Appeal Brief, Appellants pointed to paragraph 34 of the Specification as supporting disclosure for the disputed limitation. App. Br. 2. Paragraph 34 relates to Figure 7 and describes the doped comer region as "doping is said to be tailored and localized to the comer region of the SOI island" in "implementations of the invention [that] avoid doping the entire sidewall and/or the entire bottom surface of the SOI 3 Appeal2014-006102 Application 12/822,492 island 40' ." Spec. if 34. Thus, paragraph 34 defines the placement of the doping material in the comer region of the SOI island as the way the localized doping of the comer region is tailored in order to reduce capacitive coupling of the SOI island 40' with an adjacent structure 50' in Figure 7. Id. The Figures cited by Appellants in conjunction with paragraph 34 as supporting disclosure-Figures 6, 7, 13, and 14-----disclose no other way to tailor the localized doping of the comer region to reduce capacitive coupling of the SOI island with an adjacent structure, as claim 1 requires. See App. Br. 2. Appellants' recited method only requires the step of "tailoring a localized doping of the comer region" which is described in Radens (supra). In other words, the function or the result achieved by this tailored doping does not distinguish the claimed subject matter over the applied prior art. It is well settled that "apparatus claims cover what a device is, not what a device does." Hewlett-Packard Co. v. Bausch & Lomb Inc., 909 F.2d 1464, 1469 (Fed. Cir. 1990). Claims directed to an apparatus or a method of making an apparatus must be distinguished from the prior art in terms of structure rather than function. In re Schreiber, 128 F.3d 1473, 1477-78 (Fed. Cir. 1997). Appellants present no persuasive explanation or evidence to rebut the Examiner's findings. See Reply 2-5. Instead, Appellants raise the new argument that the doping of source diffusion 162 in Radens increases the capacitive coupling that could occur between SOI island 124 and capacitor plate 134. Reply Br. 2-3. It is inappropriate for Appellants to raise for the first time in the Reply Brief matters that could have been raised in the Appeal Brief. Accordingly, we find that this belated new argument is 4 Appeal2014-006102 Application 12/822,492 technically waived. Ax parte Borden, 93 USPQ2d 1473, 1474 (BPAI 2010) (informative decision) ("[T]he reply brief [is not] an opportunity to make arguments that could have been made in the principal brief on appeal to rebut the Examiner's rejections, but were not."). We agree with the Examiner that the cited disclosure in Radens meets the disputed limitation. At least Figure 2I of Radens discloses localized placement of doping material in a comer region similar to that shown in Figure 7 of Appellants' Specification, which, consistent with paragraph 34 of Appellants' Specification, reduces capacitive coupling of the SOI island with an adjacent structure and meets the disputed limitation in claim 1. For these reasons, we sustain the 35 U.S.C. § 102(b) rejection of claim 1, as well as the 35 U.S.C. § 102(b) rejection of claims 3-5 and 8, which depend from claim 1 and for which Appellants refer to and rely on the arguments made for claim 1. App. Br. 8. We also sustain the 35 U.S.C. § 102(b) rejection of independent claim 13, for which Appellants refer to and rely on the arguments made for claim 1, as well as the 35 U.S.C. § 102(b) rejection of claim 14, which depends from claim 13 and for which Appellants rely on the arguments made for claim 13. App. Br. 9-10. Claim 2-35U.S.C.§102(b) Regarding claim 2, Appellants contend Radens does not teach "forming a gate of an eDRAM device in the SOI island" and "forming the adjacent structure as a storage cell of another eDRAM device," as recited in claim 2. App. Br. 9; Reply Br. 5-6. Appellants first argue that an eDRAM is not a DRAM that is merely embedded, as the Examiner found (see Ans. 6-7), but must be embedded with an ASIC or processor. Reply Br. 5---6. Appellants point to definitions 5 Appeal2014-006102 Application 12/822,492 of eDRAMs in another patent application and in Wikipedia, but point to no disclosure in their Specification as to how the claimed eDRAM is required to be embedded with an ASIC or processor. See id. On the record before us, Appellants' contentions do not persuade us that "eDRAM" would have had the meaning urged by Appellants, or that Radens does not teach "an eDRAM device," as recited in claim 2. Appellants next contend Radens does not teach "a storage cell of another eDRAM device," as recited in claim 2. Appellants argue that Figures 2C-2I of Radens, relied on by the Examiner for claim 1, show the formation of a single DRAM device. App. Br. 9. Appellants further argue that the Examiner's reliance on Figure 3 of Radens, as disclosing that the transistor 154-160-162 formed in the SO I island 124 of a first DRAM cell is adjacent the trench capacitor OT of the neighboring cell, is incompatible with the Examiner's findings for claim 1. Reply Br. 6-7. Specifically, Appellants argue that the Examiner improperly identified the capacitor plate 134 as the recited "adjacent structure" in claim 1. Id. Appellants' arguments are not persuasive of error. As the Examiner pointed out, Radens shows the top view of an array of eDRAM cells (see Radens Fig. 3) and does not show the side view of the array. See Ans. 7. We agree with the Examiner that Radens discloses an adjacent structure surrounding the SOI island that would encompass not only the structures explicitly discussed by the Examiner (OT 134, TTO 148, and GC 154) in the discussion of claim 1, but also the adjacent eDRAM device. See id.; Radens Figs 2I, 3. Moreover, Appellants present no persuasive explanation or evidence as to why the Examiner's findings based on Figures 2I and 3 of Radens are incorrect. See Ans. 7. 6 Appeal2014-006102 Application 12/822,492 For these reasons, we are not persuaded that the Examiner erred in finding Radens teaches the disputed limitations in claim 2. Accordingly, we sustain the 35 U.S.C. § 102(b) rejection of claim 2. Claims 18-20-35 U.S.C. § 102(b) With respect to claim 18, Appellants first contend Radens does not disclose "an isolation region between the SOI island and the structure," as recited in claim 18. App. Br. 10. Appellants specifically argue that Raden's isolation region 156 is not between the SOI island 124, which contains the doped comer 162, and the structure 134. Id. Appellants, however, offer no persuasive rebuttal to the Examiner's findings that, in Radens, the isolation region 156 is structurally between the SOI island 124 and the structure 134 because it is positioned in the space separating the SOI island 124 and the structure 134. Ans. 8. Appellants also contend the Examiner erred in finding that Radens teaches that "the structure is connected to a non-zero voltage during at least a portion of device operation," as recited in claim 18. App. Br. 11-12. Appellants, however, offer no persuasive rebuttal to the Examiner's explanation that the non-zero connection is implied because, if the structure 134 of Radens was not electrically connected to a non-zero voltage at some point, the DRAM would not operate. See Ans. 9. Appellants further contend Radens does not disclose the limitation "wherein one or more comer regions of the SOI island comprise a localized doping that reduces capacitive coupling between the SOI island and the structure," as recited in claim 18. App. Br. 1 l(emphasis omitted). Appellants refer to and rely on the same arguments made for the similar 7 Appeal2014-006102 Application 12/822,492 limitation in claim 1, which we do not find persuasive of error. See Reply Br. 8. For these reasons, we are not persuaded that the Examiner erred in finding Radens teaches the disputed limitations of claim 18. Accordingly, we sustain the 35 U.S.C. § 102(b) rejection of claim 18. Regarding dependent claim 19, which depends from claim 18, Appellants refer to and rely on the argument made for claim 2 that Radens does not disclose the recited "eDRAM." App. Br. 12. For the reasons discussed above for claim 2, we are not persuaded of error and sustain the 35 U.S.C. § 102(b) rejection of claim 19. With regard to dependent claim 20, which depends from claim 19, Appellants refer to and rely on the argument made for claim 2 that Radens does not disclose the recited "another eDRAM device." App. Br. 13. For the reasons discussed above for claim 2, we are not persuaded of error and sustain the 35 U.S.C. § 102(b) rejection of claim 20. Claims 6, 7, 15, and 16-35U.S.C.§103(a) Appellants do not argue claims 6, 7, 15, and 16 separately, but refer to and rely on the arguments made for independent claims 1 and 13, from which the claims depend. Accordingly, we sustain the 35 U.S.C. § 103(a) rejection of claims 6, 7, 15, and 16. DECISION The decision of the Examiner to reject claims 1-8, 13-16, and 18-20 is affirmed. No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(l )(iv). 8 Appeal2014-006102 Application 12/822,492 AFFIRMED 9 Copy with citationCopy as parenthetical citation