Ex Parte Bontemps et alDownload PDFPatent Trial and Appeal BoardAug 22, 201613263746 (P.T.A.B. Aug. 22, 2016) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. FILING DATE 13/263,746 01/26/2012 65913 7590 08/24/2016 Intellectual Property and Licensing NXPB.V. 411 East Plumeria Drive, MS41 SAN JOSE, CA 95134 FIRST NAMED INVENTOR Joep J.M. Bontemps UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. 81374699US05 5753 EXAMINER HAN, JONATHAN ART UNIT PAPER NUMBER 2818 NOTIFICATION DATE DELIVERY MODE 08/24/2016 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address( es): ip.department.us@nxp.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte JOEP J.M. BONTEMPS, JAN JACOB KONING, CASPER VAN DER A VOORT, and JOZEF THOMAS MARTINUS VAN BEEK Appeal2015-004186 Application 13/263,746 Technology Center 2800 Before MAHSHID D. SAADAT, JOHNNY A. KUMAR, and JON M. JURGOV AN, Administrative Patent Judges. JURGOVAN, Administrative Patent Judge. DECISION ON APPEAL Appellants 1 seek review under 35 U.S.C. § 134(a) from the Final Rejection of claims 1, 2, and 4-17.2 We have jurisdiction under 35 U.S.C. § 6(b ). We affirm. 3 1 Appellants identify NXP B.V. as the real party in interest. (App. Br. 1.) 2 Claim 3 was canceled. 3 Our Decision refers to the Specification filed Oct. 9, 2011 ("Spec."), the Final Office Action mailed June 9, 2014 ("Final Act."), the Appeal Brief filed Oct. 9, 2014 ("App. Br."), the Examiner's Answer mailed Jan. 30, 2015 ("Ans."), and the Reply Brief filed Feb. 10, 2015 ("Reply Br."). Appeal2015-004186 Application 13/263,746 STATEMENT OF THE CASE The claims are directed to a micro-electromechanical system (MEMS) resonator device. (Spec. 1: 5---6.) Claim 1, reproduced below, is illustrative of the claimed subject matter: 1. A bulk-acoustic-mode MEMS resonator having a principal vibration direction, comprising: a resonator body having a first portion with a first physical layout, and a layout modification feature having a second physical layout, wherein the layout modification feature and the first portion have different lateral cross-sections along the principal vibration direction, wherein the first physical layout differs from a first design layout by a first geometric offset in response to process variations during fabrication of the resonator, and the second physical layout differs from a second design layout by a second geometric offset in response to the process variations, wherein a resonant frequency of the bulk resonator is a function of a relationship between the first geometric offset and the second geometric offset. REJECTION Claims 1, 2, and 4--17 stand rejected under 35 U.S.C. § 102(b) based on Wittwer et al. (US 7,652,547 Bl, issued Jan. 26, 2010). (Final Act. 2-5.) ANALYSIS Independent Claims 1 and 12 Issue 1: Did the Examiner err by finding Wittwer discloses a MEMS resonator with a first portion and a layout modification feature having "different lateral cross-sections"? The Examiner finds Wittwer' s MEMS resonator discloses a first portion (i.e., the resonator mass 14), and a layout modification feature (i.e., 2 Appeal2015-004186 Application 13/263,746 the holes 46) having a different lateral cross-section than the first portion (i.e., a cross-section that includes the holes 46 has a different physical layout than a cross-section taken through mass 14). (Final Act. 2-3; Ans. 2-3 (citing Wittwer Figs. 4A and 4B; col. 2:22-53).) Appellants contend Wittwer does not disclose the claimed "different lateral cross-sections," because Wittwer' s holes in the resonator mass cannot give rise to a reflection interface so that the different portions of the resonator each give rise to a respective standing wave. (App. Br. 5; Reply Br. 1-2.) Appellants further argue their Specification distinguishes between two different layout modification feature embodiments: one that is a hole or slit, and another that is a different lateral cross-section having a change in width or thickness; thus, Wittwer' s holes cannot be equated to a different lateral cross-section. (App. Br. 5---6.) Appellants contend the Examiner's interpretation of "lateral cross-section" to include holes is unreasonably broad, because the plain meaning of "lateral cross-section" is the intersection of a body in three- dimensional space with a plane taken from a side "along the principle vibration direction," which limits the claims to differences in width or thickness. (Reply Br. 2.) Appellants' contentions regarding Wittwer' s lack of a standing wave and lack of lateral cross-sections with a difference in width or thickness are not persuasive of Examiner error in the rejection, because the contentions are not commensurate with the scope of claims 1 and 12. Appellants' Specification provides several examples of layout modification features (Spec. 13:15-21), however, claims 1and12 are not limited to such features. (See In re Van Geuns, 988 F.2d 1181, 1184 (Fed. Cir. 1993): Although the claims are interpreted in light of the specification, limitations from the 3 Appeal2015-004186 Application 13/263,746 specification are not read into the claims.) We agree with the Examiner's finding that the broadest reasonable interpretation, which is consistent with Appellants' disclosure, of "different lateral cross-sections" does not preclude a first lateral cross-section through holes ( 46) that has a different physical layout than a second lateral cross-section taken through a solid portion of mass (14). (Final Act. 2-3; Ans. 2-3 (citing Wittwer Figs. 4A and 4B; col. 2:22-53).) (See In re Am. Acad. of Sci. Tech. Ctr., 367 F.3d 1359, 1369 (Fed. Cir. 2004): "[T]he PTO is obligated to give claims their broadest reasonable interpretation during examination.") Appellants' contention in the Reply Brief, page 2, that the Examiner's reliance on Wittwer' s holes to disclose the claimed layout modification feature constitutes a new ground of rejection is not found persuasive, because the Examiner cited the holes (46) as the layout modification feature in the Final Office Action. (Final Act. 2.) Issue 2: Did the Examiner err by finding Wittwer discloses a ''first physical layout differs from a first design layout by a first geometric offset"? Appellants contend claims 1 and 12 require a "first geometric offset" that is process dependent, whereas Wittwer' s disclosure of a MEMS resonator with a square mass (14) is silent regarding a first physical layout that differs from a first design layout by a first geometric offset in response to process variations. (App. Br. 6-7; Reply Br. 2-3.) We are unpersuaded of error in the Examiner's rejection, and agree with the Examiner's finding that Wittwer' s edge bias of the MEMS resonator, or deviations in the lateral dimensions of the mass compared to the desired lithography pattern, discloses first physical layout (i.e., mass 14) that differs from a first design layout (i.e., desired photolithography pattern) by a first geometric offset in 4 Appeal2015-004186 Application 13/263,746 response to process variations during fabrication of the resonator (i.e., edge bias) (Final Act. 2-3; Ans. 3--4 (citing Wittwer col. 9:19-35)), which is consistent with Appellants' disclosure of "geometric offset" (Spec. 2: 15- 17). Issue 3: Did the Examiner err by finding Wittwer discloses a "second physical layout differs from a second design layout by a second geometric offset"? Appellants contend Wittwer's disclosure of openings (46) in the mass (14) is silent regarding a "second geometric offset" for the second physical layout. As discussed regarding the "first geometric offset" supra, we agree with the Examiner's finding that Wittwer discloses a process dependent edge bias offset for the mass (14), and Wittwer further discloses the edge bias offset also affects the holes ( 46), which we agree discloses a second geometric offset for the second physical layout (Final Act 2-5; Ans. 3--4 (citing Wittwer col. 9:63 - col. 10: 14)). Accordingly, we sustain the Examiner's rejection of independent claims 1and12 under 35 U.S.C. § 102(b) based on Wittwer. Remaining Claims No separate arguments are presented for dependent claims 2, 4--11, and 13-17 (see App. Br. 7), therefore we sustain their rejection for the reasons stated with respect to independent claims 1 and 12. DECISION We affirm the Examiner's rejection of claims 1, 2, and 4--17 under 35 U.S.C. § 102(b). 5 Appeal2015-004186 Application 13/263,746 No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(l )(iv). AFFIRMED 6 Copy with citationCopy as parenthetical citation