Ex Parte Allibert et alDownload PDFBoard of Patent Appeals and InterferencesApr 27, 201011433713 (B.P.A.I. Apr. 27, 2010) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES ____________ Ex parte FREDERIC ALLIBERT and FRANCOIS BRUNIER ____________ Appeal 2009-014290 Application 11/433,713 Technology Center 1700 ____________ Decided: 27 April 2010 ____________ Before MICHAEL P. COLAIANNI, LINDA M. GAUDETTE, and JEFFREY B. ROBERTSON, Administrative Patent Judges. ROBERTSON, Administrative Patent Judge. DECISION ON APPEAL Appeal 2009-014290 Application 11/433,713 2 STATEMENT OF THE CASE Appellants appeal under 35 U.S.C. § 134(a) from the Examiner’s rejection of claims 1-10, 12-16, and 20.1 (Final Rejection mailed February 13, 2008; App. Br. 2.) We have jurisdiction pursuant to 35 U.S.C. § 6(b). We REVERSE. THE INVENTION Appellants describe a method to facilitate mapping of electronic properties of a structure made from semiconductor materials by forming a plurality of working layer islands on the structure. (Spec. 4.) Claim 1, reproduced below, is representative of the subject matter on appeal. 1. A method to facilitate mapping of electronic properties of a multilayer structure made from semiconductor materials, with the structure including a working layer and an electrically insulating layer located beneath the working layer, wherein the method comprises: applying a plurality of elementary masks onto the working layer in a sealed manner to selectively mask desired regions of the working layer in order to define boundaries of several islands therein with the elementary masks providing a cavity within each boundary to minimize contact of the masks with the islands, with each region masked from the working layer corresponding to a respective island; wet chemical etching of the masked working layer to etch away unmasked portions of the working layer, and removing the elementary masks to form a plurality of working layer islands each surrounded by the electrically insulating layer. 1 Claims 11, 17, and 19 have been canceled. (Appeal Brief filed July 1, 2008, (hereinafter “App. Br.”) 2.) Although not addressed by Appellants, it appears that claim 18 was also canceled. (Amendment filed June 11, 2007, p. 3 and 4.) Appeal 2009-014290 Application 11/433,713 3 THE REJECTION The Examiner rejected claims 1-10, 12-16, and 20 under 35 U.S.C. § 103(a) as being unpatentable over Appellants’ Admitted Prior Art (AAPA) on pages 2-3 and paragraph [0014] of the Specification, in view of Bowerman (U.S. 2,905,539 (issued Sept. 22, 1959)). The Examiner found that AAPA discloses forming at least a single island on a working layer of a semiconductor structure, but that AAPA does not explicitly discloses the application of a plurality of elementary masks in a sealed manner. (Examiner’s Answer entered September 15, 2008, (hereinafter “Ans.”) 3.) The Examiner found that “Bowerman illustrates a process of making patterns using a suction cup type masking member (18, 40) in a closed fashion on to a working layer (12, L).” (Ans. 3.) The Examiner concluded that it would have been obvious to combine Bowerman’s teaching into the AAPA’s process for achieving a desired pattern with lower processing cost and time as suggested by Bowerman. (Ans. 4.) Additionally, the Examiner concluded that it would have been obvious to form more than one island or pattern on the working layer as discussed by the AAPA, and because duplicating parts has been held to have been obvious. (Id.) Appellants contend that AAPA does not suggest a plurality of masks. (App. Br. 4.) Appellants contend that the claimed methods do not implement suction cups for the same use or in the same place as disclosed in Bowerman. (App. Br. 7-8.) Accordingly, Appellants argue that there is no reason to combine AAPA and Bowerman as suggested by the Examiner. (App. Br. 8.) Appeal 2009-014290 Application 11/433,713 4 ISSUE Did the Examiner err in determining that AAPA in view of Bowerman suggests forming a plurality of working layer islands according to the method recited in claim 1? FINDINGS OF FACT The record supports the following findings of fact (FF) by a preponderance of the evidence. 1. Bowerman discloses improved methods and apparatus for manufacture of conductive patterns on insulated supports. (Col. 1, ll. 15-21.) 2. Bowerman discloses masking members 18 and 40, having backings 20 and 42, elastomer bodies 22 and 44, and raised portions 24 and 46 having one or more elemental parts making up the desired pattern to be formed on the conductive layer 12. (Col. 5, ll. 3-11 and 34-46; Figs. 2-4.) 3. Bowerman discloses “[a] raised annular portion or ring 58 may be formed integrally with the stamp body 44 about the air passage 54 to serve as a suction cup.” (Col. 5, ll. 50-54; Fig. 3.) 4. Bowerman discloses “these cups will define regions not making up the main conductive pattern as defined by the raised pattern 46 and which will remain unetched when the assembly is subjected to the action of the etchant.” (Col. 5, ll. 57-60.) Appeal 2009-014290 Application 11/433,713 5 PRINCIPLES OF LAW The Examiner bears the initial burden, on review of prior art or on any other ground, of presenting a prima facie case of unpatentability. In re Oetiker, 977 F.2d 1443, 1445 (Fed. Cir. 1992). “‘[R]ejections on obviousness grounds cannot be sustained by mere conclusory statements; instead, there must be some articulated reasoning with some rational underpinning to support the legal conclusion of obviousness.’” KSR Int’l. Co. v. Teleflex Inc., 550 U.S. 398, 418 (2007) (quoting In re Kahn, 441 F.3d 977, 988 (Fed. Cir. 2006)). “A factfinder should be aware . . . of the distortion caused by hindsight bias and must be cautious of arguments reliant upon ex post reasoning.” KSR, 550 U.S. at 421. ANALYSIS We agree with Appellants that the Examiner’s rejection fails to present a sufficient reason to employ the suction cups disclosed in Bowerman to fabricate multiple islands to electrically characterize the fabricated structure of the AAPA. (App. Br. 7.) The Examiner states that Bowerman is relied on for the concept of using a plurality of masking patterns compared to single pattern forming mask of the AAPA. (Ans. 5.) The Examiner relies on masking members 18 and 40 disclosed by Bowerman as suction cup type masking members. (Ans. 3.) However, masking members 18 and 40 include raised portions 24 and 46, respectively, in order to provide the desired pattern. (FF 2.) In addition, Bowerman does not disclose that the raised portions 24 and 46 “provide a cavity within each boundary to minimize contact of the masks with the Appeal 2009-014290 Application 11/433,713 6 islands” as required in the claims on appeal. Moreover, Bowerman discloses that the suction cups defined by raised annular portion or ring 58, formed integrally with stamp body 44 about air passage 54 although providing regions that remain unetched, do not make up the main conductive pattern. (FF 3-4.) Accordingly, the Examiner has failed to identify a sufficient reason why one of ordinary skill in the art would have used a plurality of Bowerman’s suction cups to define a plurality of elementary masks in order to form a plurality of working layer islands as recited in the claims on appeal. CONCLUSION The Examiner erred in determining that AAPA in view of Bowerman suggests forming a plurality of working layer islands according to the method recited in claim 1. ORDER We reverse the Examiner’s decision rejecting claims 1-10, 12-16, and 20 under 35 U.S.C. § 103(a) as being unpatentable over AAPA in view of Bowerman. REVERSED Appeal 2009-014290 Application 11/433,713 7 WINSTON & STRAWN LLP Patent Department 1700 K Street, N.W. Washington DC 20006 Copy with citationCopy as parenthetical citation