Ex Parte 6,534,805 et alDownload PDFPatent Trial and Appeal BoardJun 5, 201490011833 (P.T.A.B. Jun. 5, 2014) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 90/011,833 08/02/2011 6,534,805 316732800300 4438 7590 06/06/2014 MORRISON & FOERSTER LLP 707 WILSHIRE BOULEVARD LOS ANGELES, CA 90017 EXAMINER ANDUJAR, LEONARDO ART UNIT PAPER NUMBER 3992 MAIL DATE DELIVERY MODE 06/06/2014 PAPER Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE PATENT TRIAL AND APPEAL BOARD ____________ Ex parte CYPRESS SEMICONDUCTOR CORPORATION Patent Owner and Appellant ___________ Appeal 2014-002896 Reexamination Control 90/011,833 Patent 6,534,805 B1 Technology Center 3900 ____________ Before JEAN R. HOMERE, JEFFREY S. SMITH, and DANIEL N. FISHMAN, Administrative Patent Judges. FISHMAN, Administrative Patent Judge. DECISION ON APPEAL Appeal 2014-002896 Reexamination Control 90/011,833 2 STATEMENT OF THE CASE This is an appeal under 35 U.S.C. §§ 134(b) and 306 from the final rejection of claims 1-6. We have jurisdiction under 35 U.S.C. §§ 6(b) and 306. We heard oral arguments on May 21, 2014. A transcript of that hearing will be included in the record in due time. We affirm. THE INVENTION Appellant’s invention relates to “a memory cell [that] includes a series of four substantially oblong parallel active regions, arranged side-by-side such that the inner active regions of the series include source/drain regions for p-channel transistors, and the outer active regions include source/drain regions for n-channel transistors.” Abstract. Claim 1, reproduced below, is representative: 1. A memory cell comprising a series of four substantially oblong active regions formed within a semiconductor substrate and arranged side-by-side with long axes substantially parallel, wherein each of the inner active regions of the series comprises a pair of source/drain regions for a respective p-channel transistor, and each of the outer active regions of the series comprises a pair of source/drain regions for a respective n-channel transistor. THE REJECTIONS Claims 1-4 are rejected under 35 U.S.C. § 102(b) as anticipated by Ishida (M. Ishida et al., A Novel 6T-SRAM Cell Technology Designed with Rectangular Patterns Scalable beyond 0.18 μm Generation and Desirable for Ultra High Speed Operation, IEEE IEDM, pp. 201-204 (1998)). Appeal 2014-002896 Reexamination Control 90/011,833 3 Claims 5 and 6 are rejected under 35 U.S.C. § 103(a) as unpatentable over Ishida and Osada (US 6,677,649 B2). ANALYSIS 1 CLAIMS 1-4 Appellant correctly asserts, “This appeal turns on whether the Examiner’s claim construction of ‘substantially oblong active regions’ is proper under the Patent Office’s ‘broadest reasonable interpretation’ standard for reexaminations.” App. Br. 8. Thus, the dispositive issue in the appeal is: Has the Examiner erred by interpreting “substantially oblong active regions,” as recited in claim 1, to encompass substantially rectangular active regions. We have reviewed the Examiner's rejections in light of Appellant’s arguments that the Examiner has erred. App. Br. 8-20; Reply Br. 7-35. We disagree with Appellant’s conclusions. We agree with, and adopt as our own, the findings and reasons (1) set forth by the Examiner in the office action from which this appeal is taken and, (2) as set forth by the Examiner in the Examiner’s Answer responsive to Appellant’s Appeal Brief (see Ans. 1 Rather than reiterate the arguments of Appellant and the Examiner, we refer to the Appeal Brief (“App. Br.” filed Nov 14, 2012), the Reply Brief (“Reply Br.” filed Nov. 25, 2013), Declaration of Dr. Oliver Pohland (“Pohland Decl.” filed Jan. 20, 2012), and the Answer (“Ans.” mailed Mar. 5, 2013) for their respective details. We have considered in this decision only those arguments Appellant actually raised in the Briefs. Any other arguments Appellant could have made but chose not to make in the Briefs are deemed to be waived. See 37 C.F.R. § 41.37(c)(1)(vii). Patent number 6,534,805, the subject of this appeal, is also referred to herein as “Jin ʼ805.” Appeal 2014-002896 Reexamination Control 90/011,833 4 6-25). However, we highlight and address specific arguments and findings for emphasis as follows. Claims are given their broadest reasonable construction “in light of the specification as it would be interpreted by one of ordinary skill in the art.” In re Am. Acad. of Sci. Tech. Ctr., 367 F.3d 1359, 1364 (Fed. Cir. 2004). The Examiner and Appellant agree on this point of law (see, e.g., Ans. 7; App. Br. 8) but disagree as to the skilled artisan’s understanding of “substantially oblong” in light of the Specification of Jin ʼ805. Permissive, Non-Limiting Language Used Initially, we note that the claims and Specification consistently use permissive, non-limiting language with regard the claimed “substantially oblong” shape and thus do not support Appellant’s assertion that rectangular shapes are excluded. Claim 1 refers to “substantially” oblong and the only guidance Appellant points to in the Specification is the discussion of beta ratio—a discussion that similarly uses permissive language. See, e.g., Jin ʼ805 7:16-17 (“the beta ratio should be > 1” (emphasis added)); 7:20-24 (“Consequently, an NMOS active region may be considered to be substantially oblong if the length of the region is substantially constant and if the width of the region varies by approximately 1/3 or less.” (emphasis added)). The Specification indicates only that the beta ratio “should be” greater than 1 and thus does not require such a beta ratio. Neither does the Specification indicate how much greater than one defines a shape that is “substantially oblong” as claimed but is not rectangular as shown in the prior art. The Specification indicates an active region “may be” considered substantially oblong under certain conditions but does not exclude a shape Appeal 2014-002896 Reexamination Control 90/011,833 5 being considered substantially oblong under other conditions such as a rectangle with a beta ratio of one. The discussion of a width variance as “1/3 or less” fails to indicate how close the variance can be to zero (i.e., how close to a beta ratio of 1) to define a shape that is substantially oblong but not rectangular. Thus, we conclude Appellant’s permissive language in claim 1 and permissive language in discussing of circuit stability and beta ratio does not limit the plain meaning of “substantially oblong” in claim 1 to exclude a rectangular shaped active region. “Substantially Oblong” Understanding Linked to Circuit Stability Appellant contends the discussion of beta ratio in Jin ʼ805 at column 7, lines 12-17 followed at column 7, line 20 by, “Consequently, an NMOS active region may be considered to be substantially oblong if . . . the width of the region varies by approximately 1/3 or less along the length of the region,” informs the skilled artisan that “substantially oblong” is intended to exclude rectangular shaped active regions. See App. Br. 12; see also Pohland Decl. ¶¶ 14-18. Appellant argues the sentence starting with “consequently” ties all disclosed embodiments of substantially oblong active regions to the discussion of beta ratio and circuit stability such that any active region that is substantially oblong must exhibit a beta ratio greater than one. App. Br. 12. We disagree. Column 7, lines 17-20 make clear that “an embodiment” is presented having a particular beta ratio (approximately 1.5) derived from particular exemplary width ratios and “consequently” that particular exemplary embodiment with a beta ratio of 1.5 is “considered to be substantially oblong.” We do not find the sentence starting with “consequently” links all Appeal 2014-002896 Reexamination Control 90/011,833 6 exemplary embodiments to the preceding discussion of beta ratios and circuit stability. For example, at column 6, lines 65-67, Jin ʼ805 states, “In the embodiment of FIG. 2, the active regions are substantially oblong, and in some cases may be substantially rectangular as well.” Thus, the Specification of Jin ʼ805 clearly depicts and describes at least one embodiment in which the active regions are both oblong and rectangular. Furthermore, column 7, lines 24-32 recites, Further, an NMOS active region may be considered to be substantially oblong if the length of the region is substantially constant and the width of the region by design varies only with the respective widths of the access and latch transistors. In an embodiment, “substantially oblong” may refer to any region or structure having a length that is greater than or equal to approximately three times its maximum width. However, neither the claims nor the Specification of Jin ʼ805 require that the latch and access transistors vary in width nor does the recitation of a “maximum width” necessarily require that the width of the active region varies. Thus, in these exemplary embodiments of Jin ʼ805, the active region width need not vary over its length and hence rectangular active regions are disclosed examples of “substantially oblong” active areas. In view of the above discussion, we agree with the Examiner that it is improper to interpret broad claim language to exclude an embodiment disclosed in the Specification. Ans. 8 (see Verizon Servs. Corp. v. Vonage Holdings Corp., 503 F.3d 1295, 1305 (Fed. Cir. 2007) “We normally do not interpret claim terms in a way that excludes disclosed examples in the specification.”) We, therefore, conclude the broad recitation of “substantially oblong” in claim 1 cannot be narrowly construed to exclude such disclosed examples. Appeal 2014-002896 Reexamination Control 90/011,833 7 Ensuring Circuit Stability Appellant argues the Specification links the definition of “substantially oblong” to SRAM circuit stability. App. Br. 12-15; Reply Br. 15-34; Pohland Decl. ¶¶ 15-23. Appellant specifically asserts, “That is, circuit stability requires that the NMOS active region have a beta ratio > 1.” App. Br. 12 (emphasis added). Appellant further contends, “a skilled artisan would consider ‘substantially oblong active regions’ in the context of circuit stability and would exclude cases of circuit instability, namely rectangular shaped active regions.” App. Br. 13 (emphasis added). We disagree. Even accepting, arguendo, Appellant’s arguments that understanding all disclosed embodiments in the Specification of Jin ʼ805 is informed by the discussion of circuit stability and beta ratio, nothing in the record before us provides evidence that a rectangular shaped active region is unstable such that the skilled artisan would exclude the design. Dr. Pohland’s opinion provides no evidence in support of his assertions that beta ratios greater than one ensure stability and thus, we agree with the Examiner that Dr. Pohland’s opinion is of little probative weight. Ans. 17; see also Ashland Oil, Inc. v. Delta Resins & Refractories, Inc., 776 F.2d 281, 294 (Fed. Cir. 1985) (“Opinion testimony rendered by experts must be given consideration, and while not controlling, generally is entitled to some weight. Lack of factual support for expert opinion going to factual determinations, however, may render the testimony of little probative value in a validity determination.” (citations omitted)). Even if we accept Dr. Pohland’s opinion that a beta ratio greater than one enhances or ensures stability, Dr. Pohland does not indicate how large the beta ratio must be to ensure stability. Dr. Pohland specifically states, “Even beta ratio values Appeal 2014-002896 Reexamination Control 90/011,833 8 slightly > 1 would not be expected to provide stable operation.” Pohland Decl. ¶ 33. This suggests there are other factors that relate to circuit stability. For example, special implants could be used to create different threshold voltages using a rectangular active region (see Pohland Decl. ¶ 31), or the length, rather than width, of the latch and/or pass transistors could be modified to modify beta ratio while the active region remains rectangular (see Pohland Decl. ¶ 26). More importantly, the Examiner has provided evidence (i.e., Ishida reference) that a rectangular active region “is known in the art as [a] suitable shape for both n-type/p-type active regions for memory cells such as a 6T-SRAM” and thus represents a stable circuit design. Ans. 10. We agree. Dr. Pohland also acknowledges the rectangular active regions of the Osada reference and does not indicate that such rectangular active regions render the Osada transistor design unstable. Pohland Decl. ¶¶ 35-37. In view of the above discussion, based on a preponderance of the evidence, we are not persuaded that the Examiner has erred by interpreting “substantially oblong active regions,” as recited in claim 1, to encompass substantially rectangular active regions. We are similarly unpersuaded of error in the rejection of claims 2-4 not argued separately. CLAIMS 5 AND 6 Appellant argues the Examiner erred in rejecting claims 5 and 6 for the same reasons as claim 1 contending Osada “would not cure the above deficiencies of Ishida IEDM’s purely rectangular active regions.” App. Br. 20. For the same reasons as claim 1, we are not persuaded of error in the rejection of claims 5 and 6. Appeal 2014-002896 Reexamination Control 90/011,833 9 CONCLUSIONS OF LAW Based on the analysis above, we conclude the Examiner did not err in rejecting claims 1-4 under 35 U.S.C. § 102(b) and claims 5 and 6 under 35 U.S.C. § 103(a). DECISION We affirm the Examiner’s decision rejecting claims 1-6. TIME PERIOD FOR RESPONSE Requests for extensions of time in this ex parte reexamination proceeding are governed by 37 C.F.R. § 1.550(c). See 37 C.F.R. § 41.50(f). No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(1)(iv). AFFIRMED kis Appeal 2014-002896 Reexamination Control 90/011,833 10 Patent Owner: MORRISON & FOERSTER LLP 707 Wilshire Boulevard Los Angeles CA 90017 Third Party Requester: DLA Piper LLP (US) 2000 University Avenue East Palo Alto, CA 94303-2248 Copy with citationCopy as parenthetical citation